Inventor
SUBRAMONIUM PRAMOD
US34 patents
⚠️ This page may combine multiple inventors who share the name “SUBRAMONIUM PRAMOD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
16 patentsUS7381644B1Jun 3, 2008
Pulsed PECVD method for modulating hydrogen content in hard mask
NOVELLUS SYSTEMS INC555 citations99
US9399228B2Jul 26, 2016
Method and apparatus for purging and plasma suppression in a process chamber
NOVELLUS SYSTEMS INC428 citations98
US7981810B1Jul 19, 2011
Methods of depositing highly selective transparent ashable hardmask films
NOVELLUS SYSTEMS INC54 citations98
US8999859B2Apr 7, 2015
Plasma activated conformal dielectric film deposition
NOVELLUS SYSTEMS INC56 citations96
US7915166B1Mar 29, 2011
Diffusion barrier and etch stop films
NOVELLUS SYSTEMS INC70 citations96
US10043655B2Aug 7, 2018
Plasma activated conformal dielectric film deposition
NOVELLUS SYSTEMS INC28 citations93
US9570274B2Feb 14, 2017
Plasma activated conformal dielectric film deposition
NOVELLUS SYSTEMS INC30 citations93
US7981777B1Jul 19, 2011
Methods of depositing stable and hermetic ashable hardmask films
NOVELLUS SYSTEMS INC42 citations92
US7906817B1Mar 15, 2011
High compressive stress carbon liners for MOS devices
NOVELLUS SYSTEMS INC40 citations92
US8362571B1Jan 29, 2013
High compressive stress carbon liners for MOS devices
NOVELLUS SYSTEMS INC5 citations84
US9240320B1Jan 19, 2016
Methods of depositing smooth and conformal ashable hard mask films
NOVELLUS SYSTEMS INC15 citations82
US9028924B2May 12, 2015
In-situ deposition of film stacks
NOVELLUS SYSTEMS INC7 citations82
US10214816B2Feb 26, 2019
PECVD apparatus for in-situ deposition of film stacks
NOVELLUS SYSTEMS INC6 citations81
US8962101B2Feb 24, 2015
Methods and apparatus for plasma-based deposition
NOVELLUS SYSTEMS INC7 citations79
US11746420B2Sep 5, 2023
PECVD apparatus for in-situ deposition of film stacks
NOVELLUS SYSTEMS INC1 citations72
US12385138B2Aug 12, 2025
Plasma-enhanced deposition of film stacks
NOVELLUS SYSTEMS INC0 citations60
LAM RES CORP
7 patentsUS9153482B2Oct 6, 2015
Methods and apparatus for selective deposition of cobalt in semiconductor processing
LAM RES CORP14 citations84
US9589799B2Mar 7, 2017
High selectivity and low stress carbon hardmask by pulsed low frequency RF power
LAM RES CORP10 citations83
US9633896B1Apr 25, 2017
Methods for formation of low-k aluminum-containing etch stop films
LAM RES CORP11 citations82
US10475627B2Nov 12, 2019
Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
LAM RES CORP3 citations68
US11837441B2Dec 5, 2023
Depositing a carbon hardmask by high power pulsed low frequency RF
LAM RES CORP1 citations56
US12040180B2Jul 16, 2024
Nitride films with improved etch selectivity for 3D NAND integration
LAM RES CORP0 citations51
US10541117B2Jan 21, 2020
Systems and methods for tilting a wafer for achieving deposition uniformity
LAM RES CORP0 citations42