Inventor
WABRA NORBERT
DE46 patents
⚠️ This page may combine multiple inventors who share the name “WABRA NORBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
34 patentsUS9170497B2Oct 27, 2015
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH7 citations83
US9939730B2Apr 10, 2018
Optical assembly
ZEISS CARL SMT GMBH7 citations82
US11112543B2Sep 7, 2021
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH2 citations73
US10401540B2Sep 3, 2019
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH3 citations73
US8054557B2Nov 8, 2011
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH3 citations73
US10303063B2May 28, 2019
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH1 citations72
US10061206B2Aug 28, 2018
Projection lens with wave front manipulator and related method and apparatus
ZEISS CARL SMT GMBH3 citations72
US10018907B2Jul 10, 2018
Method of operating a microlithographic projection apparatus
ZEISS CARL SMT GMBH2 citations72
US10048592B2Aug 14, 2018
Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
ZEISS CARL SMT GMBH4 citations71
US9910364B2Mar 6, 2018
Projection exposure apparatus including at least one mirror
ZEISS CARL SMT GMBH3 citations71
US10001631B2Jun 19, 2018
Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
ZEISS CARL SMT GMBH6 citations70
US12025818B2Jul 2, 2024
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH0 citations62
US10474036B2Nov 12, 2019
Optical element and optical arrangement therewith
ZEISS CARL SMT GMBH1 citations62
US10261425B2Apr 16, 2019
Projection exposure apparatus with a highly flexible manipulator
ZEISS CARL SMT GMBH1 citations62
US9436095B2Sep 6, 2016
Exposure apparatus and measuring device for a projection lens
ZEISS CARL SMT GMBH1 citations62
US9316922B2Apr 19, 2016
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH1 citations62
US9280058B2Mar 8, 2016
Projection objective for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations60
US9134613B2Sep 15, 2015
Illumination and displacement device for a projection exposure apparatus
ZEISS CARL SMT GMBH3 citations59
US9846367B2Dec 19, 2017
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH1 citations56
US12436473B2Oct 7, 2025
Optical element, optical system, lithography system, and method for operating an optical element
ZEISS CARL SMT GMBH0 citations55
US11415894B2Aug 16, 2022
Projection exposure system for semiconductor lithography having an optical arrangement
ZEISS CARL SMT GMBH1 citations53
US9964859B2May 8, 2018
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH0 citations52
US10345710B2Jul 9, 2019
Microlithographic projection exposure apparatus and measuring device for a projection lens
ZEISS CARL SMT GMBH0 citations51
US9817316B2Nov 14, 2017
Projection exposure method and projection exposure apparatus for microlithography
ZEISS CARL SMT GMBH1 citations51
US9164396B2Oct 20, 2015
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT GMBH0 citations51
US10591825B2Mar 17, 2020
Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
ZEISS CARL SMT GMBH0 citations50
US9709770B2Jul 18, 2017
Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9348234B2May 24, 2016
Microlithographic apparatus
ZEISS CARL SMT GMBH1 citations50
US9977338B2May 22, 2018
Projection objective for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations49
US9829800B2Nov 28, 2017
System correction from long timescales
ZEISS CARL SMT GMBH0 citations49
US9588445B2Mar 7, 2017
Projection objective for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations49
US9470872B2Oct 18, 2016
Reflective optical element
ZEISS CARL SMT GMBH1 citations48
US9372411B2Jun 21, 2016
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations48
US9606446B2Mar 28, 2017
Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
ZEISS CARL SMT GMBH0 citations40
ZEISS CARL SMT AG
4 patentsUS7463423B2Dec 9, 2008
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT AG9 citations84
US7782440B2Aug 24, 2010
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT AG8 citations83
US7692868B2Apr 6, 2010
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT AG6 citations73
US7719658B2May 18, 2010
Imaging system for a microlithographical projection light system
ZEISS CARL SMT AG2 citations62