Inventor
NAKAMURA HIROKO
JP40 patents
⚠️ This page may combine multiple inventors who share the name “NAKAMURA HIROKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
24 patentsUS5429730AJul 4, 1995
Method of repairing defect of structure
TOSHIBA KK114 citations97
US6265323B1Jul 24, 2001
Substrate processing method and apparatus
TOSHIBA KK54 citations96
US6028953AFeb 22, 2000
Mask defect repair system and method which controls a dose of a particle beam
TOSHIBA KK65 citations96
US5807650ASep 15, 1998
Photo mask and apparatus for repairing photo mask
TOSHIBA KK57 citations96
US5639699AJun 17, 1997
Focused ion beam deposition using TMCTS
TOSHIBA KK62 citations96
US5591970AJan 7, 1997
Charged beam apparatus
TOSHIBA KK56 citations96
US5799104AAug 25, 1998
Mask defect repair system and method
TOSHIBA KK38 citations92
US7319944B2Jan 15, 2008
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist
TOSHIBA KK11 citations84
US7026099B2Apr 11, 2006
Pattern forming method and method for manufacturing semiconductor device
TOSHIBA KK12 citations84
US9709523B1Jul 18, 2017
Gas detection apparatus
TOSHIBA KK7 citations83
US9177818B2Nov 3, 2015
Pattern formation method and block copolymer
TOSHIBA KK7 citations83
US7148138B2Dec 12, 2006
Method of forming contact hole and method of manufacturing semiconductor device
TOSHIBA KK9 citations74
US6632476B2Oct 14, 2003
Substrate processing method and substrate processing apparatus
TOSHIBA KK8 citations74
US5549995AAug 27, 1996
Photomask and method of manufacturing the same
TOSHIBA KK15 citations74
US7749687B2Jul 6, 2010
Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device
TOSHIBA KK4 citations63
US7560197B2Jul 14, 2009
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
TOSHIBA KK3 citations63
US10761051B2Sep 1, 2020
Molecular detection apparatus and molecular detection method
TOSHIBA KK1 citations62
US8986488B2Mar 24, 2015
Pattern formation method and polymer alloy base material
TOSHIBA KK3 citations60
US12347641B2Jul 1, 2025
Charged particle beam pattern forming device and charged particle beam apparatus
TOSHIBA KK0 citations52
US7972932B2Jul 5, 2011
Mark forming method and method for manufacturing semiconductor device
TOSHIBA KK0 citations52
US7816060B2Oct 19, 2010
Manufacturing method of semiconductor device, reticle correcting method, and reticle pattern data correcting method
TOSHIBA KK1 citations52
US10527581B2Jan 7, 2020
Molecular detection apparatus, molecular detection method, and organic probe
TOSHIBA KK0 citations51
US9291908B2Mar 22, 2016
Method of forming pattern and laminate
TOSHIBA KK0 citations51
US10677770B2Jun 9, 2020
Molecular detection apparatus, molecular detection method, and molecular detector
TOSHIBA KK0 citations40
NAKAMURA HIROKO
5 patentsUS8636914B2Jan 28, 2014
Method of forming pattern
NAKAMURA HIROKO7 citations82
US9017930B2Apr 28, 2015
Pattern formation method and guide pattern material
NAKAMURA HIROKO2 citations61
US8182981B2May 22, 2012
Pattern forming method
NAKAMURA HIROKO0 citations51
US9207531B2Dec 8, 2015
Pattern forming method
NAKAMURA HIROKO0 citations40
US8980748B2Mar 17, 2015
Substrate polishing method, semiconductor device and fabrication method therefor
NAKAMURA HIROKO0 citations39