Inventor
WANG CHIN-KUN
TW20 patents
⚠️ This page may combine multiple inventors who share the name “WANG CHIN-KUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
13 patentsUS5679606AOct 21, 1997
method of forming inter-metal-dielectric structure
TAIWAN SEMICONDUCTOR MFG361 citations98
US5728631AMar 17, 1998
Method for forming a low capacitance dielectric layer
TAIWAN SEMICONDUCTOR MFG37 citations92
US5552346ASep 3, 1996
Planarization and etch back process for semiconductor layers
TAIWAN SEMICONDUCTOR MFG45 citations92
US5792705AAug 11, 1998
Optimized planarization process for SOG filled vias
TAIWAN SEMICONDUCTOR MFG37 citations91
US9362175B2Jun 7, 2016
Epitaxial growth of doped film for source and drain regions
TAIWAN SEMICONDUCTOR MFG7 citations83
US8877592B2Nov 4, 2014
Epitaxial growth of doped film for source and drain regions
TAIWAN SEMICONDUCTOR MFG7 citations83
US5723380AMar 3, 1998
Method of approach to improve metal lithography and via-plug integration
TAIWAN SEMICONDUCTOR MFG8 citations73
US5567658AOct 22, 1996
Method for minimizing peeling at the surface of spin-on glasses
TAIWAN SEMICONDUCTOR MFG15 citations73
US5965938AOct 12, 1999
Integrated two-tiered via-plug to improve metal lithography # 4
TAIWAN SEMICONDUCTOR MFG4 citations62
US8041440B2Oct 18, 2011
Method and system for providing a selection of golden tools for better defect density and product yield
TAIWAN SEMICONDUCTOR MFG4 citations60
US8729645B2May 20, 2014
Substrate backside peeling control
TAIWAN SEMICONDUCTOR MFG0 citations47
US8946036B2Feb 3, 2015
Method of forming dielectric films using a plurality of oxidation gases
TAIWAN SEMICONDUCTOR MFG1 citations45
US9306024B2Apr 5, 2016
Method of forming semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations40
TAIWAN SEMICONDUCTOR MFG CO LTD
6 patentsUS9876083B2Jan 23, 2018
Semiconductor devices, FinFET devices and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations83
US9312138B2Apr 12, 2016
Method for forming gate dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US9064865B2Jun 23, 2015
Mechanisms for forming gate dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations61
US9583393B2Feb 28, 2017
Epitaxial growth of doped film for source and drain regions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9595593B2Mar 14, 2017
Semiconductor structure with interfacial layer and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US9196718B2Nov 24, 2015
In-situ nitridation of gate dielectric for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48