Inventor
DU BOIS DALE R
US36 patents
⚠️ This page may combine multiple inventors who share the name “DU BOIS DALE R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
29 patentsUS7566891B2Jul 28, 2009
Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors
APPLIED MATERIALS INC553 citations98
US5326725AJul 5, 1994
Clamping ring and susceptor therefor
APPLIED MATERIALS INC166 citations98
US10774423B2Sep 15, 2020
Tunable ground planes in plasma chambers
APPLIED MATERIALS INC41 citations94
US7777198B2Aug 17, 2010
Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
APPLIED MATERIALS INC29 citations92
US6436194B1Aug 20, 2002
Method and a system for sealing an epitaxial silicon layer on a substrate
APPLIED MATERIALS INC10 citations74
US6376387B2Apr 23, 2002
Method of sealing an epitaxial silicon layer on a substrate
APPLIED MATERIALS INC13 citations74
US6170433B1Jan 9, 2001
Method and apparatus for processing a wafer
APPLIED MATERIALS INC14 citations74
US10570517B2Feb 25, 2020
Apparatus and method for UV treatment, chemical treatment, and deposition
APPLIED MATERIALS INC2 citations73
US10153185B2Dec 11, 2018
Substrate temperature measurement in multi-zone heater
APPLIED MATERIALS INC3 citations73
US10281261B2May 7, 2019
In-situ metrology method for thickness measurement during PECVD processes
APPLIED MATERIALS INC2 citations72
US9922819B2Mar 20, 2018
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations72
US11031262B2Jun 8, 2021
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC2 citations71
US10636684B2Apr 28, 2020
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC1 citations71
US10403515B2Sep 3, 2019
Loadlock integrated bevel etcher system
APPLIED MATERIALS INC1 citations71
US9593419B2Mar 14, 2017
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations71
US10094486B2Oct 9, 2018
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC1 citations63
US7922440B2Apr 12, 2011
Apparatus and method for centering a substrate in a process chamber
APPLIED MATERIALS INC6 citations63
US6685779B2Feb 3, 2004
Method and a system for sealing an epitaxial silicon layer on a substrate
APPLIED MATERIALS INC5 citations63
US11133210B2Sep 28, 2021
Dual temperature heater
APPLIED MATERIALS INC0 citations62
US10480077B2Nov 19, 2019
PEALD apparatus to enable rapid cycling
APPLIED MATERIALS INC1 citations62
US11004663B2May 11, 2021
Chamber design for semiconductor processing
APPLIED MATERIALS INC0 citations52
US10720349B2Jul 21, 2020
Temperature measurement in multi-zone heater
APPLIED MATERIALS INC0 citations52
US9206511B2Dec 8, 2015
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC0 citations52
US6489220B2Dec 3, 2002
Method and a system for sealing an epitaxial silicon layer on a substrate
APPLIED MATERIALS INC1 citations52
US10527407B2Jan 7, 2020
In-situ metrology method for thickness measurement during PECVD processes
APPLIED MATERIALS INC0 citations51
US10325799B2Jun 18, 2019
Dual temperature heater
APPLIED MATERIALS INC0 citations51
US10518418B2Dec 31, 2019
Wafer swapper
APPLIED MATERIALS INC0 citations49
US9889567B2Feb 13, 2018
Wafer swapper
APPLIED MATERIALS INC0 citations49
US10240234B2Mar 26, 2019
Gas distribution apparatus for processing chambers
APPLIED MATERIALS INC0 citations41