Inventor

GOCHO TETSUO

JP20 patents

⚠️ This page may combine multiple inventors who share the name “GOCHO TETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GOCHO TETSUO

SONY CORP

Method of forming trench isolation having polishing step and method of manufacturing semiconductor device

Semiconductor device containing Si, O and N anti-reflective layer

Anti-reflective layer used to form a semiconductor device

Method of forming a resist pattern using an anti-reflective layer

Multilayer resist pattern forming method

Semiconductor device with antireflection film

Method of manufacturing a semiconductor device

Method for forming multi-layer interconnections

Method of forming a photoresist pattern using an anti-reflective

Method for forming metal plug and/or wiring metal layer

Bias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling means

Method of fabricating electronic devices of the type including smoothing process using polishing

Manufacturing process for a semiconductor device using bias ecrcvd and an etch stop layer

Method of forming trench isolation having polishing step and method of manufacturing semiconductor device

SONY SEMICONDUCTOR SOLUTIONS CORP

Semiconductor device

Solid-state image sensor

Semiconductor device including a field effect transistor with nanostructure based laminated channel structure and a field effect transistor with a single channel structure

Semiconductor device

Semiconductor device, method of manufacturing semiconductor device, and electronic apparatus

Solid-state image sensor