Inventor
HULI LIOR
US22 patents
Patents
22 patentsUS10770294B2Sep 8, 2020
Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance
TOKYO ELECTRON LTD6 citations72
US9791779B2Oct 17, 2017
EUV resist etch durability improvement and pattern collapse mitigation
TOKYO ELECTRON LTD3 citations72
US9711419B2Jul 18, 2017
Substrate backside texturing
TOKYO ELECTRON LTD3 citations72
US9281251B2Mar 8, 2016
Substrate backside texturing
TOKYO ELECTRON LTD3 citations72
US11482454B2Oct 25, 2022
Methods for forming self-aligned contacts using spin-on silicon carbide
TOKYO ELECTRON LTD2 citations71
US10403501B2Sep 3, 2019
High-purity dispense system
TOKYO ELECTRON LTD3 citations71
US9991133B2Jun 5, 2018
Method for etch-based planarization of a substrate
TOKYO ELECTRON LTD3 citations69
US12393121B2Aug 19, 2025
Point-of-use blending of rinse solutions for EUV processing to mitigate pattern collapse
TOKYO ELECTRON LTD0 citations62
US12216400B2Feb 4, 2025
Directed self-assembly
TOKYO ELECTRON LTD0 citations62
US11762297B2Sep 19, 2023
Point-of-use blending of rinse solutions to mitigate pattern collapse
TOKYO ELECTRON LTD0 citations62
US12406887B2Sep 2, 2025
Selective film formation using a self-assembled monolayer
TOKYO ELECTRON LTD0 citations61
US12080599B2Sep 3, 2024
Methods for forming self-aligned contacts using spin-on silicon carbide
TOKYO ELECTRON LTD0 citations61
US8975009B2Mar 10, 2015
Track processing to remove organic films in directed self-assembly chemo-epitaxy applications
TOKYO ELECTRON LTD3 citations61
US12193231B2Jan 7, 2025
Fabricating three-dimensional semiconductor structures
TOKYO ELECTRON LTD0 citations58
US10141183B2Nov 27, 2018
Methods of spin-on deposition of metal oxides
TOKYO ELECTRON LTD1 citations52
US10935889B2Mar 2, 2021
Extreme ultra-violet sensitivity reduction using shrink and growth method
TOKYO ELECTRON LTD0 citations51
US12598747B2Apr 7, 2026
Fabricating three-dimensional semiconductor structures
TOKYO ELECTRON LTD0 citations49
US11243465B2Feb 8, 2022
Plasma treatment method to enhance surface adhesion for lithography
TOKYO ELECTRON LTD0 citations49
US9086631B2Jul 21, 2015
EUV resist sensitivity reduction
TOKYO ELECTRON LTD1 citations49
US11383211B2Jul 12, 2022
Point-of-use dynamic concentration delivery system with high flow and high uniformity
TOKYO ELECTRON LTD0 citations47
US10685857B2Jun 16, 2020
Dispense nozzle with a shielding device
TOKYO ELECTRON LTD0 citations41
US10354872B2Jul 16, 2019
High-precision dispense system with meniscus control
TOKYO ELECTRON LTD0 citations39