P

Inventor

WU JASON Y

US17 patents

Patents

17 patents
US11659714B1May 23, 2023

Ferroelectric device film stacks with texturing layer, and method of forming such

KEPLER COMPUTING INC27 citations93
US11955512B1Apr 9, 2024

Dual hydrogen barrier layer for trench capacitors integrated with low density film for logic structures and methods of fabrication

KEPLER COMPUTING INC3 citations86
US12094923B2Sep 17, 2024

Rapid thermal annealing (RTA) methodologies for integration of perovskite-material based memory devices

KEPLER COMPUTING INC0 citations62
US12034086B1Jul 9, 2024

Trench capacitors with continuous dielectric layer and methods of fabrication

KEPLER COMPUTING INC0 citations62
US12029043B1Jul 2, 2024

Planar and trench capacitors with hydrogen barrier dielectric for logic and memory applications and methods of fabrication

KEPLER COMPUTING INC0 citations62
US12022662B1Jun 25, 2024

Planar and trench capacitors for logic and memory applications and methods of fabrication

KEPLER COMPUTING INC0 citations62
US12016185B1Jun 18, 2024

Planar and trench capacitors for logic and memory applications

KEPLER COMPUTING INC0 citations62
US11996438B1May 28, 2024

Pocket flow for trench capacitors integrated with planar capacitors on a same substrate and method of fabrication

KEPLER COMPUTING INC0 citations62
US11985832B1May 14, 2024

Planar and trench capacitors with hydrogen barrier dielectric for logic and memory applications

KEPLER COMPUTING INC0 citations62
US11961877B1Apr 16, 2024

Dual hydrogen barrier layer for trench capacitors integrated with low density film for logic structures

KEPLER COMPUTING INC0 citations62
US11908704B2Feb 20, 2024

Method of fabricating a perovskite-material based planar capacitor using rapid thermal annealing (RTA) methodologies

KEPLER COMPUTING INC0 citations62
US11894417B2Feb 6, 2024

Method of fabricating a perovskite-material based trench capacitor using rapid thermal annealing (RTA) methodologies

KEPLER COMPUTING INC0 citations62
US11769790B2Sep 26, 2023

Rapid thermal annealing (RTA) methodologies for integration of perovskite-material based trench capacitors

KEPLER COMPUTING INC0 citations62
US11744081B1Aug 29, 2023

Ferroelectric device film stacks with texturing layer which is part of a bottom electrode, and method of forming such

KEPLER COMPUTING INC0 citations61
US11716858B1Aug 1, 2023

Ferroelectric device film stacks with texturing layer which is part of a bottom electrode and a barrier, and method of forming such

KEPLER COMPUTING INC0 citations61
US11832451B1Nov 28, 2023

High density ferroelectric random access memory (FeRAM) devices and methods of fabrication

KEPLER COMPUTING INC0 citations60
US12262543B1Mar 25, 2025

High density ferroelectric random access memory (FeRAM) devices and methods of fabrication

KEPLER COMPUTING INC0 citations58