Inventor
CHENG YAHRU
TW31 patents
Patents
31 patentsUS11705332B2Jul 18, 2023
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations85
US12159787B2Dec 3, 2024
Method of manufacturing a semiconductor device and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12057315B2Aug 6, 2024
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12002675B2Jun 4, 2024
Photoresist layer outgassing prevention
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11971657B2Apr 30, 2024
Photoresist developer and method of developing photoresist
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11822237B2Nov 21, 2023
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11029602B2Jun 8, 2021
Photoresist composition and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11901189B2Feb 13, 2024
Ambient controlled two-step thermal treatment for spin-on coating layer planarization
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12517434B2Jan 6, 2026
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12487527B2Dec 2, 2025
Photoresist developer and method of developing photoresist
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12463034B2Nov 4, 2025
Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12374548B2Jul 29, 2025
Photoresist layer outgassing prevention
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354874B2Jul 8, 2025
Method of manufacturing semiconductor devices and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12222643B2Feb 11, 2025
Method of manufacturing a semiconductor device and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12135501B2Nov 5, 2024
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12106961B2Oct 1, 2024
Humidity control or aqueous treatment for EUV metallic resist
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12094952B2Sep 17, 2024
Air spacer formation with a spin-on dielectric material
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12013641B2Jun 18, 2024
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11942322B2Mar 26, 2024
Method of manufacturing semiconductor devices and pattern formation method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11703762B2Jul 18, 2023
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11626482B2Apr 11, 2023
Air spacer formation with a spin-on dielectric material
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11003082B2May 11, 2021
Method for forming semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10768527B2Sep 8, 2020
Resist solvents for photolithography applications
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11276568B2Mar 15, 2022
Method for manufacturing a semiconductor device and a coating material
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10529552B2Jan 7, 2020
Method for manufacturing a semiconductor device and a coating material
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US12272554B2Apr 8, 2025
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12271113B2Apr 8, 2025
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11784046B2Oct 10, 2023
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10770293B2Sep 8, 2020
Method for manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12578640B2Mar 17, 2026
Photosensitive material for photoresist and lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12087592B2Sep 10, 2024
Ambient controlled two-step thermal treatment for spin-on coating layer planarization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50