P

Inventor

LIN WEI-KEN

TW29 patents

Patents

29 patents
US10304677B2May 28, 2019

Low-k feature formation processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US9691766B1Jun 27, 2017

Fin field effect transistor and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD16 citations82
US10833170B2Nov 10, 2020

Low-k gate spacer and methods for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10658252B2May 19, 2020

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10490650B2Nov 26, 2019

Low-k gate spacer and methods for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10269664B2Apr 23, 2019

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10964548B2Mar 30, 2021

Fin field-effect transistor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10854713B2Dec 1, 2020

Method for forming trench structure of semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10497577B2Dec 3, 2019

Fin field-effect transistor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US9871100B2Jan 16, 2018

Trench structure of semiconductor device having uneven nitrogen distribution liner

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10797175B2Oct 6, 2020

Fin field-effect transistor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10340384B2Jul 2, 2019

Method of manufacturing fin field-effect transistor device

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US11205597B2Dec 21, 2021

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations66
US12464786B2Nov 4, 2025

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855182B2Dec 26, 2023

Low-k gate spacer and methods for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12506001B2Dec 23, 2025

Low-K feature formation processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12125908B2Oct 22, 2024

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11735430B2Aug 22, 2023

Fin field-effect transistor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11705327B2Jul 18, 2023

Low-k feature formation processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11450772B2Sep 20, 2022

Fin field-effect transistor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11342454B2May 24, 2022

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11295948B2Apr 5, 2022

Low-K feature formation processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10950431B2Mar 16, 2021

Low-k feature formation processes and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11942418B2Mar 26, 2024

Semiconductor structure and method for making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9824943B2Nov 21, 2017

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10847634B2Nov 24, 2020

Field effect transistor and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10700197B2Jun 30, 2020

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10504898B2Dec 10, 2019

Fin field-effect transistor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9991154B2Jun 5, 2018

Method for fabricating a fin field effect transistor and a shallow trench isolation

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations30