Inventor
TAKIZAWA HIROO
JP81 patents
⚠️ This page may combine multiple inventors who share the name “TAKIZAWA HIROO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
28 patentsUS7588863B2Sep 15, 2009
Hologram recording method and hologram recording material
FUJIFILM CORP103 citations98
US7572555B2Aug 11, 2009
Hologram recording material, hologram recording method and optical recording medium
FUJIFILM CORP102 citations98
US9448482B2Sep 20, 2016
Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device
FUJIFILM CORP9 citations84
US9188865B2Nov 17, 2015
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP7 citations84
US7582390B2Sep 1, 2009
Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
FUJIFILM CORP8 citations84
US9291898B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
FUJIFILM CORP8 citations83
US9291896B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
FUJIFILM CORP8 citations83
US9527809B2Dec 27, 2016
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
FUJIFILM CORP6 citations73
US9470980B2Oct 18, 2016
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
FUJIFILM CORP5 citations73
US9170489B2Oct 27, 2015
Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
FUJIFILM CORP4 citations73
US9651863B2May 16, 2017
Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP2 citations72
US9423690B2Aug 23, 2016
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
FUJIFILM CORP3 citations72
US9291897B2Mar 22, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
FUJIFILM CORP3 citations72
US9400430B2Jul 26, 2016
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern
FUJIFILM CORP2 citations63
US9323153B2Apr 26, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
FUJIFILM CORP2 citations63
US9223215B2Dec 29, 2015
Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
FUJIFILM CORP2 citations63
US9069246B2Jun 30, 2015
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these
FUJIFILM CORP3 citations63
US7582391B2Sep 1, 2009
Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material
FUJIFILM CORP5 citations63
US7531667B2May 12, 2009
Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material
FUJIFILM CORP5 citations63
US10444627B2Oct 15, 2019
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
FUJIFILM CORP1 citations62
US7771915B2Aug 10, 2010
Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
FUJIFILM CORP4 citations62
US10031419B2Jul 24, 2018
Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
FUJIFILM CORP1 citations52
US9766547B2Sep 19, 2017
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device
FUJIFILM CORP1 citations52
US9755160B2Sep 5, 2017
Thin film transistor
FUJIFILM CORP0 citations52
US9500951B2Nov 22, 2016
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations52
US9411230B2Aug 9, 2016
Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
FUJIFILM CORP1 citations52
US9323150B2Apr 26, 2016
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
FUJIFILM CORP1 citations52
US9188862B2Nov 17, 2015
Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
FUJIFILM CORP0 citations52
FUJI PHOTO FILM CO LTD
16 patentsUS6084176AJul 4, 2000
Photoelectric conversion device and solar cell
FUJI PHOTO FILM CO LTD152 citations99
US6051359AApr 18, 2000
Heat developable light-sensitive material and method of forming color images
FUJI PHOTO FILM CO LTD20 citations92
US7112616B2Sep 26, 2006
Two-photon absorbing polymerizable composition and polymerization process thereof
FUJI PHOTO FILM CO LTD28 citations91
US7236277B2Jun 26, 2007
Holographic recording medium and holographic recording method using the same
FUJI PHOTO FILM CO LTD9 citations74
US5756275AMay 26, 1998
Color-developing agent, silver halide photographic light-sensitive material and image-forming method
FUJI PHOTO FILM CO LTD13 citations74
US5874203AFeb 23, 1999
Color-developing agent, silver halide photographic light-sensitive material and image-forming method
FUJI PHOTO FILM CO LTD14 citations73
US6750003B2Jun 15, 2004
Methine dye and silver halide photographic material containing the same
FUJI PHOTO FILM CO LTD4 citations63
US6632597B2Oct 14, 2003
Methine dye and silver halide photographic material containing the same
FUJI PHOTO FILM CO LTD2 citations63
US5747231AMay 5, 1998
Silver halide photographic material
FUJI PHOTO FILM CO LTD2 citations63
US5719018AFeb 17, 1998
Silver halide color light-sensitive material
FUJI PHOTO FILM CO LTD3 citations63
US5667959ASep 16, 1997
Silver halide photographic material and hydroxamic acid based compound used therefor
FUJI PHOTO FILM CO LTD3 citations63
US5612174AMar 18, 1997
Photographic yellow dye-forming couplers and silver halide color photographic materials containing the same
FUJI PHOTO FILM CO LTD3 citations63
US5484692AJan 16, 1996
Silver halide photographic material and image forming method using the same
FUJI PHOTO FILM CO LTD4 citations63
US5468600ANov 21, 1995
Silver halide color photographic material
FUJI PHOTO FILM CO LTD4 citations63
US5503969AApr 2, 1996
Heat-developable color light-sensitive material
FUJI PHOTO FILM CO LTD2 citations61
US5380638AJan 10, 1995
Cyan dye-forming coupler and a silver halide color photographic material containing the same
FUJI PHOTO FILM CO LTD2 citations57
MURAKAMI TAKESHI
2 patentsUDC IRELAND LTD
2 patentsTAKIZAWA HIROO
1 patentFUJI XEROX CO LTD
1 patentShowing the top 50 of 81 patents by PatentIndex Score.