Inventor

HIRANO SHUJI

JP51 patents

⚠️ This page may combine multiple inventors who share the name “HIRANO SHUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HIRANO SHUJI

FUJIFILM CORP

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device

Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition and pattern formation method using the same

Treatment liquid and pattern forming method

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Positive resist composition and pattern forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Lithographic printing plate precursor and method for producing lithographic printing plate

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing

Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same

Polymerizable compound and polymer compound obtained by using the same

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

Lithographic printing plate precursor, method for producing lithographic printing plate, polymer particle, and composition

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device

Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device

Resist composition and pattern-forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith

Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition

HIRANO SHUJI

Polymerizable compound and polymer compound obtained by using the same

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

IWATO KAORU

Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

TAKAHASHI HIDENORI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

FUJI FILM CORP

Positive resist composition and pattern forming method using the same

YOSHIDOME MASAHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition

KATO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

SAEGUSA HIROSHI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition

KAWABATA TAKESHI

Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same

FUJIMORI TORU

Chemical amplification resist composition, and mold preparation method and resist film using the same