Inventor

MIZUTANI KAZUYOSHI

JP71 patents

⚠️ This page may combine multiple inventors who share the name “MIZUTANI KAZUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIZUTANI KAZUYOSHI

FUJI PHOTO FILM CO LTD

Bottom anti-reflective coating material composition and method for forming resist pattern using the same

Positive-working resist composition

Positive resist composition

Positive resist composition

Positive photoresist composition

Positive working photoresist composition

Positive photoresist composition comprising a polysiloxane

Bottom anti-reflective coating material composition and method for forming resist pattern using the same

Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same

Phenol compounds containing methoxymethyl group or hydroxymethyl group

Photosensitive resin composition

Resist composition

Planographic printing plate precursor provided with an image forming layer containing a fluorine macromolecular compound

Lower layer resist composition for silicon-containing two-layer resist

Positive-working photoresist composition

Negative-working image recording material

Positive photoresist composition and pattern making method using the same

Positive resist composition and pattern forming method using the same

Chemical amplification type resist composition

Positive photoresist composition

Composition for anti-reflective coating material

Compostion for anti-reflective coating material

Siloxane polymers and positive working light-sensitive compositions comprising the same

Light-sensitive composition comprising a polysiloxane and a naphthoquinone

Light-sensitive composition containing onium salt and polysiloxane reaction product

Positive-working resist composition

Positive resist composition and pattern formation method using the same

Positive resist composition

Positive resist composition

Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene

Positive resist composition to be irradiated with one of an electron beam and X-ray

Positive working photosensitive lithographic printing plate utilizing phenol derivative compound containing photosensitive composition

Siloxane polymers and positive working light-sensitive compositions comprising the same

FUJIFILM CORP

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

Photosensitive resin composition

Positive resist composition and pattern forming method using the same

Resist composition for electron beam, EUV or X-ray

Positive resist composition

Positive resist composition and pattern forming method using the same

Positive resist composition for immersion exposure and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same

Positive resist composition

Positive working resist composition

Positive resist composition and pattern formation method using the same

Positive resist composition

Positive resist composition and pattern formation method using the same

FUJI FILM CORP

Positive resist composition and pattern forming method using the same

KATAOKA SHOHEI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same