Inventor
ONO HARUHITO
JP32 patents
⚠️ This page may combine multiple inventors who share the name “ONO HARUHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
26 patentsUS7126141B2Oct 24, 2006
Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK38 citations96
US6965153B1Nov 15, 2005
Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK62 citations96
US6872950B2Mar 29, 2005
Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
CANON KK58 citations96
US5682085AOct 28, 1997
Multi-electron beam source and image display device using the same
CANON KK70 citations96
US5185554AFeb 9, 1993
Electron-beam generator and image display apparatus making use of it
CANON KK71 citations96
US4956578ASep 11, 1990
Surface conduction electron-emitting device
CANON KK70 citations96
US6903345B2Jun 7, 2005
Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK44 citations93
US6603128B2Aug 5, 2003
Charged-particle beam exposure apparatus and device manufacturing method
CANON KK32 citations93
US6011567AJan 4, 2000
Image forming apparatus
CANON KK21 citations93
US6005333ADec 21, 1999
Electron beam-generating device, and image-forming apparatus and recording apparatus employing the same
CANON KK23 citations93
US7700390B2Apr 20, 2010
Method for fabricating three-dimensional photonic crystal
CANON KK9 citations84
US6872951B2Mar 29, 2005
Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK18 citations84
US6559463B2May 6, 2003
Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method
CANON KK16 citations84
US6157137ADec 5, 2000
Multi-electron beam source with driving circuit for preventing voltage spikes
CANON KK16 citations84
US8361336B2Jan 29, 2013
Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing method
CANON KK8 citations83
US6872952B2Mar 29, 2005
Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method
CANON KK8 citations74
US6335127B1Jan 1, 2002
Charged beam mask having strut wider than charged beam, with shape that matches charged beam
CANON KK10 citations74
US5757123AMay 26, 1998
Electron-beam generator and image display apparatus making use of it
CANON KK5 citations74
US5627436AMay 6, 1997
Multi-electron beam source with a cut off circuit and image device using the same
CANON KK15 citations74
US5138402AAug 11, 1992
Semiconductor electron emitting device
CANON KK13 citations74
US4999083AMar 12, 1991
Method of etching crystalline material with etchant injection inlet
CANON KK15 citations74
US7038226B2May 2, 2006
Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK4 citations63
US5233196AAug 3, 1993
Electron beam apparatus and method for driving the same
CANON KK3 citations63
US7902637B2Mar 8, 2011
Nano structure and method of manufacturing nano structure
CANON KK2 citations62
US7727410B2Jun 1, 2010
Process for formation of three-dimensional photonic crystal
CANON KK4 citations62
US7611810B2Nov 3, 2009
Charged beam processing apparatus
CANON KK2 citations62