Inventor
TATEYAMA KIYOHISA
JP68 patents
⚠️ This page may combine multiple inventors who share the name “TATEYAMA KIYOHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
49 patentsUS6104002AAug 15, 2000
Heat treating apparatus
TOKYO ELECTRON LTD388 citations99
US5871584AFeb 16, 1999
Processing apparatus and processing method
TOKYO ELECTRON LTD162 citations99
US5718763AFeb 17, 1998
Resist processing apparatus for a rectangular substrate
TOKYO ELECTRON LTD154 citations99
US5442416AAug 15, 1995
Resist processing method
TOKYO ELECTRON LTD138 citations99
US5202716AApr 13, 1993
Resist process system
TOKYO ELECTRON LTD146 citations99
US5919520AJul 6, 1999
Coating method and apparatus for semiconductor process
TOKYO ELECTRON LTD105 citations98
US5762708AJun 9, 1998
Coating apparatus therefor
TOKYO ELECTRON LTD107 citations98
US5375291ADec 27, 1994
Device having brush for scrubbing substrate
TOKYO ELECTRON LTD127 citations98
US6749688B2Jun 15, 2004
Coating method and apparatus for semiconductor process
TOKYO ELECTRON LTD47 citations96
US6207231B1Mar 27, 2001
Coating film forming method and coating apparatus
TOKYO ELECTRON LTD56 citations96
US6090205AJul 18, 2000
Apparatus for processing substrate
TOKYO ELECTRON LTD50 citations96
US6062241AMay 16, 2000
Substrate conveying device and substrate conveying method
TOKYO ELECTRON LTD48 citations96
US5965200AOct 12, 1999
Processing apparatus and processing method
TOKYO ELECTRON LTD73 citations96
US5941083AAug 24, 1999
Cooling device and cooling method
TOKYO ELECTRON LTD41 citations96
US5834737ANov 10, 1998
Heat treating apparatus
TOKYO ELECTRON LTD77 citations96
US5817156AOct 6, 1998
Substrate heat treatment table apparatus
TOKYO ELECTRON LTD69 citations96
US5803970ASep 8, 1998
Method of forming a coating film and coating apparatus
TOKYO ELECTRON LTD82 citations96
US5695817ADec 9, 1997
Method of forming a coating film
TOKYO ELECTRON LTD92 citations96
US5688322ANov 18, 1997
Apparatus for coating resist on substrate
TOKYO ELECTRON LTD89 citations96
US5626675AMay 6, 1997
Resist processing apparatus, substrate processing apparatus and method of transferring a processed article
TOKYO ELECTRON LTD64 citations96
US5421056AJun 6, 1995
Spin chuck and treatment apparatus using same
TOKYO ELECTRON LTD79 citations96
US5374312ADec 20, 1994
Liquid coating system
TOKYO ELECTRON LTD119 citations96
US5339128AAug 16, 1994
Resist processing method
TOKYO ELECTRON LTD81 citations96
US5252137AOct 12, 1993
System and method for applying a liquid
TOKYO ELECTRON LTD77 citations96
US5250114AOct 5, 1993
Coating apparatus with nozzle moving means
TOKYO ELECTRON LTD61 citations96
US6159288ADec 12, 2000
Method and apparatus for cleaning treatment
TOKYO ELECTRON LTD57 citations95
US5945161AAug 31, 1999
Apparatus and method for supplying process solution to surface of substrate to be processed
TOKYO ELECTRON LTD60 citations95
US5645391AJul 8, 1997
Substrate transfer apparatus, and method of transferring substrates
TOKYO ELECTRON LTD75 citations94
US6299938B1Oct 9, 2001
Apparatus and method of applying resist
TOKYO ELECTRON LTD22 citations93
US6227786B1May 8, 2001
Substrate treating apparatus
TOKYO ELECTRON LTD44 citations93
US6193807B1Feb 27, 2001
Substrate conveying device and substrate conveying method
TOKYO ELECTRON LTD22 citations93
US6126725AOct 3, 2000
Deaerating apparatus and treatment apparatus with gas permeable films
TOKYO ELECTRON LTD29 citations93
US6062288AMay 16, 2000
Processing apparatus
TOKYO ELECTRON LTD52 citations93
US5993518ANov 30, 1999
Deaerating apparatus, deaerating method, and treatment apparatus
TOKYO ELECTRON LTD46 citations93
US5970717AOct 26, 1999
Cooling method, cooling apparatus and treatment apparatus
TOKYO ELECTRON LTD45 citations93
US5967159AOct 19, 1999
Substrate conveying device and substrate conveying method
TOKYO ELECTRON LTD20 citations93
US5943880AAug 31, 1999
Cooling apparatus, cooling method, and processing apparatus
TOKYO ELECTRON LTD32 citations93
US5912054AJun 15, 1999
Coating method and apparatus
TOKYO ELECTRON LTD24 citations93
US6962477B2Nov 8, 2005
Apparatus for and method of transferring substrates
TOKYO ELECTRON LTD14 citations92
US6837672B1Jan 4, 2005
Apparatus for and method of transferring substrates
TOKYO ELECTRON LTD26 citations92
US6635113B2Oct 21, 2003
Coating apparatus and coating method
TOKYO ELECTRON LTD31 citations92
US6451515B2Sep 17, 2002
Substrate treating method
TOKYO ELECTRON LTD31 citations92
US6443641B2Sep 3, 2002
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD28 citations92
US6361600B1Mar 26, 2002
Film forming apparatus and film forming method
TOKYO ELECTRON LTD23 citations92
US6261007B1Jul 17, 2001
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD43 citations92
US6216475B1Apr 17, 2001
Cooling device and cooling method
TOKYO ELECTRON LTD19 citations92
US6168665B1Jan 2, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD46 citations92
US6152677ANov 28, 2000
Apparatus for and method of transferring substrates
TOKYO ELECTRON LTD32 citations92
US6110282AAug 29, 2000
Coating apparatus for semiconductor process
TOKYO ELECTRON LTD23 citations92
TOKYO ELECTRON SAGA KABUSHIKI
1 patentShowing the top 50 of 68 patents by PatentIndex Score.