Inventor

KOHARA HIDEKATSU

JP56 patents

⚠️ This page may combine multiple inventors who share the name “KOHARA HIDEKATSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOHARA HIDEKATSU

TOKYO OHKA KOGYO CO LTD

Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant

Photosensitive compositions and a method of patterning using the same

Method for forming a resist pattern on a substrate surface and a scum-remover therefor

High-sensitivity positive-working photoresist composition

Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant

Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins

Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio

Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant

Electron beam-curable resist composition and method for fine patterning using the same

Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye

Positive photoresist composition and process for forming contact hole

Positive photoresist composition and process for forming contact hole

Positive resist composition

Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound

Lithographic double-coated patterning plate with undercoat levelling layer

Method for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additive

Positive-working photosensitive composition with three difference 1,2-naphthoquinone diazide sulfonic acid esters to include the ester of curcumin

Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation

Positive photoresist composition and process and synthesizing polyphenol compound

Positive photoresist composition and process for forming resist pattern using same

Polyphenol compound, quinonediazide ester and positive photoresist composition

Positive photoresist composition

Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent

Alkali-developable positive-working photosensitive resin composition

Electron beam-curable resist composition and method for fine patterning using the same

Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms

Positive photoresist compositions and multilayer resist materials using same

Positive photoresist compositions and multilayer resist materials using the same

Positive photoresist compositions and multilayer resist materials using the same

Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives

Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound

Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4&#39;-bis(dialkylamino)benzophenone

Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive

Positive-working quinone diazide composition containing N,N&#39;,N&#34;-substituted isocyanurate compound and associated article

Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone

Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern

Positive photoresist composition and process for forming resist pattern

Positive photoresist composition and process for forming resist pattern

Positive photoresist composition and process for forming contact hole

Production process of polyphenol diesters, and positive photosensitive compositions

Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer

Positive photoresist composition

Positive photoresist compositions and multilayer resist materials using same

Positive photoresist compositions and a process for producing the same

Positive photoresist composition

Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound

Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol

Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group

Phenol novolak resin, production process thereof, and positive photoresist composition using the same

TOKYO OHKA KOGYA CO LTD

Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin

Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone

Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article