Inventor

NAKAYAMA TOSHIMASA

JP113 patents

⚠️ This page may combine multiple inventors who share the name “NAKAYAMA TOSHIMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAKAYAMA TOSHIMASA

TOKYO OHKA KOGYO CO LTD

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Remover solution composition for resist and method for removing resist using the same

Process for treating a lithographic substrate and a rinse solution for the treatment

Cyanooxime sulfonate compound

Post-ashing treating liquid compositions and a process for treatment therewith

Substrate treatment method

Remover solution composition for resist and method for removing resist using the same

Developer solution for photolithographic patterning

Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound

Method and liquid coating composition for the formation of silica-based coating film on substrate surface

Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant

Composition for forming antireflective coating film and method for forming resist pattern using same

Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film

Compounds for use in a positive-working resist composition

Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition

Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition

Negative-working radiation-sensitive resist composition

Remover solution for resist

Method for forming a resist pattern on a substrate surface and a scum-remover therefor

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Post-ashing treating method for substrates

Coating solution for forming silica coating and method of forming silica coating

Method for the formation of resist pattern

Positive resist composition

Positive-working photoresist composition

Chemical-sensitization photoresist composition

Positive-working photoresist composition and multilayered resist material using the same

Photoresist composition

Coating solution for silica-based coating film and method for the preparation thereof

Undercoating composition for photolithography

High-sensitivity positive-working photoresist composition

Method for forming a protective coating film on electronic parts and devices

Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant

Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins

Method for the formation of a silica-based coating film

Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant

Chemical-amplification-type negative resist composition and method for forming negative resist pattern

Chemical-sensitization resist composition

Positive-working photoresist composition

Developer solution for actinic ray-sensitive resist

Electron beam-curable resist composition and method for fine patterning using the same

Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye

Developer solution for acitinic ray sensitive resist

Positive photoresist composition and process for forming contact hole

Chemical-sensitization resist composition

Positive photoresist composition and process for forming contact hole

Negative-working chemical-amplification photoresist composition

TOKYO OHIKA KOGYO CO LTD

Rinsing solution for lithography and method for processing substrate with the use of the same

TOKYO OHTA KOGYO CO LTD

Developer solution for photoresist composition