Inventor
HARTLEY JOHN G
US14 patents
⚠️ This page may combine multiple inventors who share the name “HARTLEY JOHN G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
11 patentsUS6291819B1Sep 18, 2001
Method of calibrating an electron beam system for lithography
IBM21 citations92
US5621216AApr 15, 1997
Hardware/software implementation for multipass E-beam mask writing
IBM39 citations88
US6614035B2Sep 2, 2003
Multi-beam shaped beam lithography system
IBM19 citations83
US6822248B2Nov 23, 2004
Spatial phase locking with shaped electron beam lithography
IBM13 citations80
US5916716AJun 29, 1999
Emulation methodology for critical dimension control in E-Beam lithography
IBM16 citations71
US5570405AOct 29, 1996
Registration and alignment technique for X-ray mask fabrication
IBM18 citations69
US6486953B1Nov 26, 2002
Accurate real-time landing angle and telecentricity measurement in lithographic systems
IBM4 citations62
US6369396B1Apr 9, 2002
Calibration target for electron beams
IBM2 citations62
US6091072AJul 18, 2000
Piece-wise processing of very large semiconductor designs
IBM6 citations59
US5838013ANov 17, 1998
Method for monitoring resist charging in a charged particle system
IBM1 citations50
US6818906B1Nov 16, 2004
Electron beam position reference system
IBM1 citations48