Inventor

CHANCE RANDAL W

US20 patents

⚠️ This page may combine multiple inventors who share the name “CHANCE RANDAL W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHANCE RANDAL W

MICRON TECHNOLOGY INC

Method for reducing, by a factor or 2-N, the minimum masking pitch of a photolithographic process

Method of manufacturing edge connected semiconductor die

Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography

Methods of forming semiconductor constructions

Static discharge circuit having low breakdown voltage bipolar clamp

Method to align mask patterns

Phase shifting reticle fabrication using ion implantation

Process for fabricating, on the edge of a silicon mesa, a MOSFET which has a spacer-shaped gate and a right-angled channel path

Semiconductor package utilizing edge connected semiconductor dice

Method to align mask patterns

Method to align mask patterns

Semiconductor constructions

Semiconductor memory device transistor and cell structure

Split-polysilicon CMOS process incorporating unmasked punchthrough and source/drain implants

Reduced mask manufacture of semiconductor memory devices

Method to align mask patterns

Methods for converting reticle configurations

Imprint templates for imprint lithography, and methods of patterning a plurality of substrates

Methods for converting reticle configurations and methods for modifying reticles

SANDHU GURTEJ S

Method to align mask patterns