P

Inventor

KIERS ANTOINE GASTON MARIE

NL36 patents
⚠️ This page may combine multiple inventors who share the name “KIERS ANTOINE GASTON MARIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

28 patents
US7791727B2Sep 7, 2010

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV89 citations99
US7791732B2Sep 7, 2010

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV80 citations98
US7112813B2Sep 26, 2006

Device inspection method and apparatus using an asymmetric marker

ASML NETHERLANDS BV61 citations96
US7911612B2Mar 22, 2011

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV35 citations93
US8760662B2Jun 24, 2014

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV16 citations92
US8054467B2Nov 8, 2011

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV15 citations92
US11379970B2Jul 5, 2022

Deep learning for semantic segmentation of pattern

ASML NETHERLANDS BV8 citations85
US9128065B2Sep 8, 2015

Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method

ASML NETHERLANDS BV5 citations84
US10241055B2Mar 26, 2019

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV3 citations83
US7715019B2May 11, 2010

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV14 citations82
US7532331B2May 12, 2009

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV10 citations82
US7443486B2Oct 28, 2008

Method for predicting a critical dimension of a feature imaged by a lithographic apparatus

ASML NETHERLANDS BV13 citations81
US7916927B2Mar 29, 2011

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV11 citations77
US7151594B2Dec 19, 2006

Test pattern, inspection method, and device manufacturing method

ASML NETHERLANDS BV6 citations74
US10955353B2Mar 23, 2021

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV2 citations73
US7596420B2Sep 29, 2009

Device manufacturing method and computer program product

ASML NETHERLANDS BV7 citations73
US9454084B2Sep 27, 2016

Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system

ASML NETHERLANDS BV5 citations72
US7532307B2May 12, 2009

Focus determination method, device manufacturing method, and mask

ASML NETHERLANDS BV6 citations63
US7312860B2Dec 25, 2007

Test pattern, inspection method, and device manufacturing method

ASML NETHERLANDS BV4 citations63
US11847570B2Dec 19, 2023

Deep learning for semantic segmentation of pattern

ASML NETHERLANDS BV1 citations62
US11525786B2Dec 13, 2022

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV0 citations62
US7692792B2Apr 6, 2010

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV6 citations62
US7630087B2Dec 8, 2009

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV2 citations60
US12315175B2May 27, 2025

Method in the manufacturing process of a device, a non-transitory computer-readable medium and a system configured to perform the method

ASML NETHERLANDS BV0 citations59
US11966168B2Apr 23, 2024

Method of measuring variation, inspection system, computer program, and computer system

ASML NETHERLANDS BV0 citations59
US11131936B2Sep 28, 2021

Method of measuring variation, inspection system, computer program, and computer system

ASML NETHERLANDS BV0 citations59
US7605907B2Oct 20, 2009

Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method

ASML NETHERLANDS BV6 citations57
US9360770B2Jun 7, 2016

Method of determining focus corrections, lithographic processing cell and device manufacturing method

ASML NETHERLANDS BV0 citations49

CRAMER HUGO AUGUSTINUS JOSEPH

2 patents

VAN DE KERKHOF MARCUS ADRIANUS

1 patent

DEN BOEF ARIE JEFFREY MARIA

1 patent

KISTEMAN AREND JOHANNES

1 patent

KIERS ANTOINE GASTON MARIE

1 patent

QUAEDACKERS JOHANNES ANNA

1 patent

VAN DER LAAN HANS

1 patent