P

Inventor

SUZUKI NOBUMASA

JP40 patents
⚠️ This page may combine multiple inventors who share the name “SUZUKI NOBUMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

31 patents
US6497783B1Dec 24, 2002

Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method

CANON KK89 citations96
US5803975ASep 8, 1998

Microwave plasma processing apparatus and method therefor

CANON KK59 citations96
US5753320AMay 19, 1998

Process for forming deposited film

CANON KK73 citations96
US5538699AJul 23, 1996

Microwave introducing device provided with an endless circular waveguide and plasma treating apparatus provided with said device

CANON KK48 citations96
US5487875AJan 30, 1996

Microwave introducing device provided with an endless circular waveguide and plasma treating apparatus provided with said device

CANON KK47 citations96
US6652709B1Nov 25, 2003

Plasma processing apparatus having circular waveguide, and plasma processing method

CANON KK62 citations94
US6238527B1May 29, 2001

Thin film forming apparatus and method of forming thin film of compound by using the same

CANON KK66 citations94
US5433787AJul 18, 1995

Apparatus for forming deposited film including light transmissive diffusion plate

CANON KK87 citations94
US5803974ASep 8, 1998

Chemical vapor deposition apparatus

CANON KK21 citations93
US6677549B2Jan 13, 2004

Plasma processing apparatus having permeable window covered with light shielding film

CANON KK21 citations92
US6080679AJun 27, 2000

High-speed soft evacuation process and system

CANON KK38 citations92
US5985091ANov 16, 1999

Microwave plasma processing apparatus and microwave plasma processing method

CANON KK29 citations92
US5565247AOct 15, 1996

Process for forming a functional deposited film

CANON KK29 citations92
US5585148ADec 17, 1996

Process for forming a deposited film using a light transmissive perforated diffusion plate

CANON KK26 citations91
US6870123B2Mar 22, 2005

Microwave applicator, plasma processing apparatus having same, and plasma processing method

CANON KK23 citations90
US6829279B1Dec 7, 2004

Laser oscillating apparatus, exposure apparatus using the same and device fabrication method

CANON KK13 citations84
US5983829ANov 16, 1999

Microwave plasma etching apparatus

CANON KK18 citations84
US5707692AJan 13, 1998

Apparatus and method for processing a base substance using plasma and a magnetic field

CANON KK19 citations84
US6884318B2Apr 26, 2005

Plasma processing system and surface processing method

CANON KK7 citations74
US6744802B1Jun 1, 2004

Laser oscillating apparatus with slotted waveguide

CANON KK8 citations74
US6541982B2Apr 1, 2003

Plasma density measuring method and apparatus, and plasma processing system using the same

CANON KK12 citations74
US6007878ADec 28, 1999

Process for producing an optical recording medium having a protective layer formed using a plasma processing device

CANON KK10 citations74
US5681394AOct 28, 1997

Photo-excited processing apparatus and method for manufacturing a semiconductor device by using the same

CANON KK16 citations74
US6650678B1Nov 18, 2003

Laser oscillating apparatus

CANON KK5 citations63
US5368647ANov 29, 1994

Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface

CANON KK4 citations63
US5223039AJun 29, 1993

Illuminating apparatus and photo-excited process apparatus using same

CANON KK6 citations63
US6916678B2Jul 12, 2005

Surface modification method

CANON KK5 citations62
US5975012ANov 2, 1999

Deposition apparatus

CANON KK4 citations61
US7982381B2Jul 19, 2011

Electron source and image display apparatus

CANON KK0 citations52
US6801554B1Oct 5, 2004

Laser oscillating apparatus, exposure apparatus, and device fabrication method

CANON KK1 citations52
US8012822B2Sep 6, 2011

Process for forming dielectric films

CANON KK1 citations51

SHOWA IKA KOGYO CO LTD

3 patents

TOSOH CORP

3 patents

KENWOOD CORP

2 patents

F TECH INC

1 patent