Inventor

FAGUET JACQUES

US35 patents

⚠️ This page may combine multiple inventors who share the name “FAGUET JACQUES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FAGUET JACQUES

TOKYO ELECTRON LTD

Method and system for performing plasma enhanced atomic layer deposition

Method of integrating PEALD Ta-containing films into Cu metallization

Method for precursor delivery

Method for forming salicides

Particulate reduction using temperature-controlled chamber shield

Methods for area-selective deposition of polymer films using sequentially pulsed initiated chemical vapor deposition (spiCVD)

Method for depositing a planarization layer using polymerization chemical vapor deposition

Method and system for fabricating a nano-structure

Method of light enhanced atomic layer deposition

Method for enlarging a nano-structure

Roughness reduction methods for materials using illuminated etch solutions

Ionized PVD with sequential deposition and etching

Methods for stabilization of self-assembled monolayers (SAMs) using sequentially pulsed initiated chemical vapor deposition (spiCVD)

Selective etching with fluorine, oxygen and noble gas containing plasmas

Plasma etching method

Ionized physical vapor deposition (iPVD) process

Etching method and etching apparatus

Methods for etching a substrate using a hybrid wet atomic layer etching process

Systems for etching a substrate using a hybrid wet atomic layer etching process

Dynamically adjusted purge timing in wet atomic layer etching

Processing systems and platforms for roughness reduction of materials using illuminated etch solutions

Photo-assisted chemical vapor etch for selective removal of ruthenium

Methods for wet atomic layer etching of copper

LEE ERIC M

Method for chemical vapor deposition control

Apparatus for chemical vapor deposition control

Chemical vapor deposition method

FAGUET JACQUES

Plasma enhanced atomic layer deposition system and method

Vapor deposition system

Method and system for performing different deposition processes within a single chamber

NASMAN RONALD

High temperature gas heating device for a vapor deposition system

Gas heating device for a vapor deposition system

LIU JUNJUN

Dielectric treatment module using scanning IR radiation source

IBM

Implementing the post-porosity plasma protection (P4) process using I-CVD

YUE HONGYU

Ultraviolet treatment apparatus

BRCKA JOZEF

Method and device for controlling pattern and structure formation by an electric field