Inventor

TSUCHIMURA TOMOTAKA

JP73 patents

⚠️ This page may combine multiple inventors who share the name “TSUCHIMURA TOMOTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSUCHIMURA TOMOTAKA

FUJIFILM CORP

Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Curable composition

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate

Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device

Resin composition and pattern forming method using the same

Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these

Ink for ink jet-recording curable through irradiation with a radioactive ray and method for preparing lithographic printing plates using the same

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Polymerizable compositions, color filters, production methods thereof, and solid-state imaging devices

Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition

Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask

Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition

TSUCHIMURA TOMOTAKA

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition

Composition, resist film, pattern forming method, and inkjet recording method

Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same

FUJI PHOTO FILM CO LTD

Image recording material and lithographic printing plate precursor

Planographic printing original plate

Positive-type image-forming material and planographic printing plate precursor

FUJIMORI TORU

Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor

Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor

INASAKI TAKESHI

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition

KAMIMURA SOU

Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound

YAMAGUCHI SHUHEI

Positive photosensitive composition

KAWABATA TAKESHI

Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition

ITO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

NAGATA YUZO

Dispersion composition, polymerizable composition, light-shielding color filter, solid-state image pick-up element, liquid crystal display device, wafer level lens, and image pick-up unit

MAKINO MASAOMI

Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor

EINAGA HIROYUKI

Black photosensitive resin composition, and color filter and method of producing the same

TSUCHIHASHI TORU

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

TAKAHASHI HIDENORI

Photosensitive composition, pattern-forming method using the composition, and resin used in the composition

MURAKAMI YOSUKE

Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor

SHIMADA KAZUTO

Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device