Inventor

GIRARD JEAN-MARC

FR79 patents

⚠️ This page may combine multiple inventors who share the name “GIRARD JEAN-MARC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GIRARD JEAN-MARC

AIR LIQUIDE

Hexakis(monohydrocarbylamino) disilanes and method for the preparation thereof

Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition

Method for forming dielectric or metallic films

Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof

Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition

Method for producing silicon nitride films

Method and system for recovering and recirculating a deuterium-containing gas

Semiconductor processing system and method for controlling moisture level therein

Process and device for measuring the amount of impurities in a gas sample to be analyzed

High C content molecules for C implant

Device for delivering any one of a plurality of gases to an apparatus

Preparation of Si—H containing iodosilanes via halide exchange reaction

Process gas supply mechanism for ALCVD systems

Si-containing film forming precursors and methods of using the same

Titanium-containing film forming compositions for vapor deposition of titanium-containing films

Si-containing film forming precursors and methods of using the same

Aluminum implant using new compounds

Si-containing film forming precursors and methods of using the same

Tungsten pentachloride conditioning and crystalline phase manipulation

Tungsten pentachloride conditioning and crystalline phase manipulation

Tungsten pentachloride conditioning and crystalline phase manipulation

Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same

Device for regulating the flow of gases having substantially different molar masses

Method and device for delivering a pure gas charged with a predetermined quantity of at least one gaseous impurity to an apparatus

Selection device for providing one or the other of two gases to an apparatus

Device for delivering any one of a plurality of gases to an apparatus

Method and device for filling a distribution line with corrosive gas

Catalytic reduction of halogenated carbosilanes and halogenated carbodisilanes

Titanium-containing film forming compositions for vapor deposition of titanium-containing films

Methods for vapor deposition of group 4 transition metal-containing films using Group 4 transition metal-containing films forming compositions

Titanium-containing film forming compositions for vapor deposition of titanium-containing films

Si-containing film forming precursors and methods of using the same

Preprocessing method for solid material, and solid material product filled with solid material manufactured using said solid material preprocessing method

Perhydropolysilazane compositions and methods for forming oxide films using same

Tungsten pentachloride conditioning and crystalline phase manipulation

N—H free and Si-rich per-hydridopolysilzane compositions, their synthesis, and applications

N—H free and SI-rich per-hydridopolysilzane compositions, their synthesis, and applications

Devices having a rare earth (oxy) fluoride coating for improved resistance to corrosive chemical environments and methods for making and using these devices

Molybdenum pentachloride conditioning and crystalline phase manipulation

Group 6 transition metal-containing compositions for vapor deposition of group 6 transition metal-containing films

Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes

Ultra-low temperature ALD to form high-quality Si-containing film

AIR LIQUIDE ADVANCED MAT INC

Short inorganic trisilylamine-based polysilazanes for thin film deposition

Synthesis methods for halosilanes

L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude

Si-containing film forming precursors and methods of using the same

Vapor deposition of silicon-containing films using penta-substituted disilanes

GATINEAU SATOKO

Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process

AIR LIQUIDE AMERICAN

Carbosilane substituted amine precursors for deposition of Si-containing films and methods thereof

FEDERATION DES COOPERATIVES MI

Method for partial or total dealcoholization of wine and/or cider and device for implementing such method

AIR LIQUIDE ELECTRONICS US LP

Synthesis methods for carbosilanes