Inventor

TOREK KEVIN J

US50 patents

⚠️ This page may combine multiple inventors who share the name “TOREK KEVIN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOREK KEVIN J

MICRON TECHNOLOGY INC

Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum

Method for selective etching of oxides

Acid blend for removing etch residue

Acid blend for removing etch residue

Acid blend for removing etch residue

Acid blend for removing etch residue

Process for selectively etching silicon nitride in the presence of silicon oxide

High selectivity BPSG to TEOS etchant

Method of forming an inset in a tungsten silicide layer in a transistor gate stack

High selectivity BPSG to TEOS etchant

Method of etching thermally grown oxide substantially selectively relative to deposited oxide

Process for selectively etching silicon nitride in the presence of silicon oxide

Delivery of dissolved ozone

Delivery of dissolved ozone

Photoresist developer with reduced resist toppling and method of using same

Methods of forming semiconductor structures comprising thin film transistors including oxide semiconductors

Double-sided container capacitors using a sacrificial layer

Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates

Trench isolation method

Subresolution silicon features and methods for forming the same

Double-sided container capacitors using a sacrificial layer

Methods of removing at least some of a material from a semiconductor substrate

Method of etching thermally grown oxide substantially selectively relative to deposited oxide

Method of making an oxide structure having a finely calibrated thickness

Array of vertical transistors and method used in forming an array of vertical transistors

Methods of forming semiconductor structures comprising thin film transistors including oxide semiconductors

Semiconductor processing methods utilizing low concentrations of reactive etching components

Semiconductor processing methods utilizing low concentrations of reactive etching components

Semiconductor processing methods

Methods for forming semiconductor devices and semiconductor device structures

Methods of forming capacitors

Methods of forming transistors and methods of forming devices comprising transistors

Integrated assemblies and methods of forming integrated assemblies

Methods of selectively removing silicon

Acid blend for removing etch residue

Method of forming trench isolation within a semiconductor substrate

Oxide structure having a finely calibrated thickness

Array of vertical transistors and method used in forming an array of vertical transistors

Photoresist processing methods

Methods of removing material from a semiconductor substrate

Methods of forming capacitors

Apparatuses comprising vertical transistors having gate electrodes at least partially recessed within channel regions, and related methods and systems

Methods of forming a pattern on a substrate

TOREK KEVIN J

Subresolution silicon features and methods for forming the same

Subresolution silicon features and methods for forming the same

Photoresist processing methods

Photoresist processing methods

LUGANI GURPREET

Methods of forming capacitors

ROUND ROCK RES LLC

High selectivity BPSG to TEOS etchant

SHEA KEVIN R

Selective etching of oxides to metal nitrides and metal oxides