Inventor
SHIRASUNA TOSHIYASU
JP32 patents
Patents
32 patentsUS6861373B2Mar 1, 2005
Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode
CANON KK52 citations96
US6702898B2Mar 9, 2004
Deposited film forming apparatus
CANON KK43 citations96
US6391394B1May 21, 2002
Method for manufacturing electrophotographic photosensitive member and jig used therein
CANON KK26 citations92
US6250251B1Jun 26, 2001
Vacuum processing apparatus and vacuum processing method
CANON KK49 citations92
US5582944ADec 10, 1996
Light receiving member
CANON KK37 citations92
US5129359AJul 14, 1992
Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate
CANON KK25 citations92
US6321759B1Nov 27, 2001
Method for cleaning a substrate
CANON KK15 citations84
US6849123B2Feb 1, 2005
Plasma processing method and method for manufacturing semiconductor device
CANON KK7 citations74
US6696108B2Feb 24, 2004
Vacuum processing method
CANON KK11 citations74
US6350497B1Feb 26, 2002
Plasma processing method
CANON KK8 citations74
US6300225B1Oct 9, 2001
Plasma processing method
CANON KK11 citations74
US6165274ADec 26, 2000
Plasma processing apparatus and method
CANON KK15 citations74
US6155201ADec 5, 2000
Plasma processing apparatus and plasma processing method
CANON KK13 citations74
US5582648ADec 10, 1996
Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition
CANON KK10 citations74
US5338580AAug 16, 1994
Method of preparation of functional deposited film by microwave plasma chemical vapor deposition
CANON KK15 citations74
US7051671B2May 30, 2006
Vacuum processing apparatus in which high frequency powers having mutually different frequencies are used to generate plasma for processing an article
CANON KK9 citations73
US6443191B1Sep 3, 2002
Vacuum processing methods
CANON KK9 citations73
US6946167B2Sep 20, 2005
Deposited film forming apparatus and deposited film forming method
CANON KK2 citations63
US6649020B1Nov 18, 2003
Plasma processing apparatus
CANON KK3 citations63
US6347601B1Feb 19, 2002
Film forming apparatus
CANON KK3 citations63
US6336423B1Jan 8, 2002
Apparatus for forming a deposited film by plasma chemical vapor deposition
CANON KK5 citations63
US6148763ANov 21, 2000
Deposited film forming apparatus
CANON KK6 citations63
US5656404AAug 12, 1997
Light receiving member with an amorphous silicon photoconductive layer containing fluorine atoms in an amount of 1 to 95 atomic ppm
CANON KK4 citations63
US12541157B2Feb 3, 2026
Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of producing electrophotographic photosensitive member
CANON KK0 citations61
US7550180B2Jun 23, 2009
Plasma treatment method
CANON KK0 citations52
US6761128B2Jul 13, 2004
Plasma treatment apparatus
CANON KK0 citations52
US6486045B2Nov 26, 2002
Apparatus and method for forming deposited film
CANON KK1 citations52
US6413592B1Jul 2, 2002
Apparatus for forming a deposited film by plasma chemical vapor deposition
CANON KK0 citations52
US10976682B2Apr 13, 2021
Method for controlling electrophotographic apparatus
CANON KK0 citations51
US9588447B2Mar 7, 2017
Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus
CANON KK0 citations51
US9091948B2Jul 28, 2015
Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus
CANON KK0 citations51
US12523943B2Jan 13, 2026
Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of producing electrophotographic photosensitive member
CANON KK0 citations50