Inventor
SAKIYAMA YUKINORI
US22 patents
Patents
22 patentsUS10553465B2Feb 4, 2020
Control of water bow in multiple stations
LAM RES CORP18 citations94
US9508547B1Nov 29, 2016
Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors
LAM RES CORP31 citations94
US9644271B1May 9, 2017
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
LAM RES CORP21 citations93
US11183406B2Nov 23, 2021
Control of wafer bow in multiple stations
LAM RES CORP7 citations84
US10128160B2Nov 13, 2018
Systems and methods for detection of plasma instability by electrical measurement
LAM RES CORP6 citations84
US10121708B2Nov 6, 2018
Systems and methods for detection of plasma instability by optical diagnosis
LAM RES CORP7 citations84
US9824941B2Nov 21, 2017
Systems and methods for detection of plasma instability by electrical measurement
LAM RES CORP3 citations84
US10378107B2Aug 13, 2019
Low volume showerhead with faceplate holes for improved flow uniformity
LAM RES CORP11 citations83
US11823928B2Nov 21, 2023
Control of wafer bow in multiple stations
LAM RES CORP4 citations75
US11393729B2Jul 19, 2022
Systems and methods for controlling plasma instability in semiconductor fabrication
LAM RES CORP2 citations73
US10510625B2Dec 17, 2019
Systems and methods for controlling plasma instability in semiconductor fabrication
LAM RES CORP2 citations73
US9997422B2Jun 12, 2018
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
LAM RES CORP2 citations73
US10622243B2Apr 14, 2020
Planar substrate edge contact with open volume equalization pathways and side containment
LAM RES CORP2 citations72
US10475627B2Nov 12, 2019
Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
LAM RES CORP3 citations68
US12581875B2Mar 17, 2026
Processing tool capable for forming carbon layers on substrates
LAM RES CORP0 citations62
US11443975B2Sep 13, 2022
Planar substrate edge contact with open volume equalization pathways and side containment
LAM RES CORP0 citations62
US12322582B2Jun 3, 2025
Anomalous plasma event detection and mitigation in semiconductor processing
LAM RES CORP1 citations60
US9941113B2Apr 10, 2018
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
LAM RES CORP0 citations51
US9875883B2Jan 23, 2018
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
LAM RES CORP0 citations51
US9754769B2Sep 5, 2017
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
LAM RES CORP0 citations51
US12340992B2Jun 24, 2025
Detection and location of anomalous plasma events in fabrication chambers
LAM RES CORP0 citations46
US10301718B2May 28, 2019
Asymmetric pedestal/carrier ring arrangement for edge impedance modulation
LAM RES CORP0 citations40