Inventor
RANGINENI YASWANTH
US20 patents
Patents
20 patentsUS9644271B1May 9, 2017
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
LAM RES CORP21 citations93
US9263350B2Feb 16, 2016
Multi-station plasma reactor with RF balancing
LAM RES CORP19 citations92
US10622962B2Apr 14, 2020
Combiner and distributor for adjusting impedances or power across multiple plasma processing stations
LAM RES CORP7 citations84
US10187032B2Jan 22, 2019
Combiner and distributor for adjusting impedances or power across multiple plasma processing stations
LAM RES CORP8 citations84
US10128160B2Nov 13, 2018
Systems and methods for detection of plasma instability by electrical measurement
LAM RES CORP6 citations84
US9840776B2Dec 12, 2017
Multi-station plasma reactor with RF balancing
LAM RES CORP7 citations84
US9824941B2Nov 21, 2017
Systems and methods for detection of plasma instability by electrical measurement
LAM RES CORP3 citations84
US10145010B2Dec 4, 2018
Multi-station plasma reactor with RF balancing
LAM RES CORP4 citations73
US9997422B2Jun 12, 2018
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
LAM RES CORP2 citations73
US11258420B2Feb 22, 2022
Mutually induced filters
LAM RES CORP2 citations72
US10637427B2Apr 28, 2020
Mutually induced filters
LAM RES CORP3 citations72
US12143087B2Nov 12, 2024
Combiner and distributor for adjusting impedances or power across multiple plasma processing stations
LAM RES CORP0 citations62
US12052006B2Jul 30, 2024
Mutually induced filters
LAM RES CORP0 citations62
US11258421B2Feb 22, 2022
Combiner and distributor for adjusting impedances or power across multiple plasma processing stations
LAM RES CORP0 citations62
US10879092B2Dec 29, 2020
Fault detection using showerhead voltage variation
LAM RES CORP0 citations51
US10043690B2Aug 7, 2018
Fault detection using showerhead voltage variation
LAM RES CORP0 citations51
US10044338B2Aug 7, 2018
Mutually induced filters
LAM RES CORP0 citations51
US9941113B2Apr 10, 2018
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
LAM RES CORP0 citations51
US9875883B2Jan 23, 2018
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
LAM RES CORP0 citations51
US9754769B2Sep 5, 2017
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
LAM RES CORP0 citations51