Inventor

AUGUSTYNIAK EDWARD

US32 patents

⚠️ This page may combine multiple inventors who share the name “AUGUSTYNIAK EDWARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AUGUSTYNIAK EDWARD

LAM RES CORP

Control of water bow in multiple stations

Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors

Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Control of wafer bow in multiple stations

Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

Systems and methods for detection of plasma instability by electrical measurement

Systems and methods for detection of plasma instability by optical diagnosis

Systems and methods for detection of plasma instability by electrical measurement

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Low volume showerhead with faceplate holes for improved flow uniformity

Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates

Control of wafer bow in multiple stations

Systems and methods for controlling plasma instability in semiconductor fabrication

Systems and methods for controlling plasma instability in semiconductor fabrication

Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability

Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

Measuring individual layer thickness during multi-layer deposition semiconductor processing

NOVELLUS SYSTEMS INC

Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor

Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage

Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage

KAPOOR SUNIL

Closed loop control system for RF power balancing of the stations in a multi-station processing tool with shared RF source

KEIL DOUGLAS

Mechanical suppression of parasitic plasma in substrate processing chamber

VARADARAJAN SESHA

Plasma particle extraction process for PECVD