Inventor

KEIL DOUGLAS

US45 patents

⚠️ This page may combine multiple inventors who share the name “KEIL DOUGLAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KEIL DOUGLAS

LAM RES CORP

Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication

Plasma etching of organic antireflective coating

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Methods for measuring a set of electrical characteristics in a plasma

Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasma

Adjustable height PIF probe

Method and apparatus to detect fault conditions of plasma processing reactor

Mechanism for bow reduction and critical dimension control in etching silicon dioxide using hydrogen-containing additive gases in fluorocarbon gas chemistry

Systems and methods for detection of plasma instability by electrical measurement

Systems and methods for detection of plasma instability by optical diagnosis

Systems and methods for detection of plasma instability by electrical measurement

Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Post-development treatment of patterned photoresist to promote cross-linking of polymer chains

Profile control of oxide trench features for dual damascene applications

Apparatus for measuring a set of electrical characteristics in a plasma

Systems and methods for controlling plasma instability in semiconductor fabrication

Systems and methods for controlling plasma instability in semiconductor fabrication

Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition

Adjustable height PIF probe

Mechanical suppression of parasitic plasma in substrate processing chamber

Mechanical suppression of parasitic plasma in substrate processing chamber

Mechanical suppression of parasitic plasma in substrate processing chamber

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

BOOTH JEAN-PAUL

Processing system for detecting in-situ arcing events during substrate processing

Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber

Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber

Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber

Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber

RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber

NOVELLUS SYSTEMS INC

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage

Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage

Systems and methods for determining film thickness using DC self-bias voltage

KEIL DOUGLAS

Mechanical suppression of parasitic plasma in substrate processing chamber

Apparatus and method for controlling plasma potential

Methods for automatically characterizing a plasma

HUDSON ERIC

Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system