Inventor
EBISAWA KAZUAKI
JP11 patents
Patents
11 patentsUS10394122B2Aug 27, 2019
Resist composition, method for forming resist pattern, compound, and acid generator
TOKYO OHKA KOGYO CO LTD6 citations71
US10890845B2Jan 12, 2021
Chemically amplified positive-type photosensitive resin composition
TOKYO OHKA KOGYO CO LTD1 citations61
US11022880B2Jun 1, 2021
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
TOKYO OHKA KOGYO CO LTD1 citations60
US11131927B2Sep 28, 2021
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
TOKYO OHKA KOGYO CO LTD0 citations49
US11061326B2Jul 13, 2021
Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
TOKYO OHKA KOGYO CO LTD0 citations49
US12312489B2May 27, 2025
Curable composition, cured product and method for forming insulating film
TOKYO OHKA KOGYO CO LTD0 citations48
US11803122B2Oct 31, 2023
Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound
TOKYO OHKA KOGYO CO LTD0 citations48
US11643389B2May 9, 2023
Method for producing maleimide compound, compound and solid resin
TOKYO OHKA KOGYO CO LTD0 citations48
US11550221B2Jan 10, 2023
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound
TOKYO OHKA KOGYO CO LTD0 citations48
US11016387B2May 25, 2021
Chemically amplified positive-type photosensitive resin composition, method of manufacturing substrate with template, and method of manufacturing plated article
TOKYO OHKA KOGYO CO LTD0 citations47
US10509318B2Dec 17, 2019
Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article
TOKYO OHKA KOGYO CO LTD0 citations38