P

Inventor

KAMIZONO TAKASHI

JP21 patents
⚠️ This page may combine multiple inventors who share the name “KAMIZONO TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

14 patents
US10324377B2Jun 18, 2019

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations72
US10101658B2Oct 16, 2018

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD6 citations72
US10394122B2Aug 27, 2019

Resist composition, method for forming resist pattern, compound, and acid generator

TOKYO OHKA KOGYO CO LTD6 citations71
US12163057B2Dec 10, 2024

Surface treatment liquid, surface treatment method, and method for producing surface-treated roll-shaped sheet

TOKYO OHKA KOGYO CO LTD0 citations62
US11066531B2Jul 20, 2021

Surface treatment liquid and hydrophilic treatment method

TOKYO OHKA KOGYO CO LTD0 citations62
US11198772B2Dec 14, 2021

Surface treatment liquid and surface treatment method

TOKYO OHKA KOGYO CO LTD0 citations61
US10261416B2Apr 16, 2019

Resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD1 citations61
US8822034B2Sep 2, 2014

Film-forming composition, diffusing agent composition, method for manufacturing film-forming composition, and method for manufacturing diffusing agent composition

TOKYO OHKA KOGYO CO LTD3 citations61
US11204551B2Dec 21, 2021

Resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations51
US11167540B2Nov 9, 2021

Method for manufacturing flow path device

TOKYO OHKA KOGYO CO LTD0 citations51
US11041086B2Jun 22, 2021

Hydrophilic treatment method and surface treatment liquid

TOKYO OHKA KOGYO CO LTD0 citations51
US9190276B2Nov 17, 2015

Method of diffusing impurity-diffusing component and method of manufacturing solar cell

TOKYO OHKA KOGYO CO LTD0 citations50
US10241406B2Mar 26, 2019

Resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations40
US9620666B2Apr 11, 2017

Method for forming an impurity diffusion layer by applying a diffusing agent composition

TOKYO OHKA KOGYO CO LTD0 citations40

NEC CORP

4 patents

KAMIZONO TAKASHI

2 patents

MORITA TOSHIRO

1 patent