Inventor
TAKAKUWA MANABU
JP29 patents
⚠️ This page may combine multiple inventors who share the name “TAKAKUWA MANABU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA MEMORY CORP
13 patentsUS11152218B2Oct 19, 2021
Template, imprint apparatus, imprint method and imprint apparatus management method
TOSHIBA MEMORY CORP2 citations72
US10283392B2May 7, 2019
Alignment method, pattern formation system, and exposure device
TOSHIBA MEMORY CORP2 citations72
US9966284B2May 8, 2018
Alignment method, pattern formation system, and exposure device
TOSHIBA MEMORY CORP3 citations72
US9784573B2Oct 10, 2017
Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP2 citations72
US10921722B2Feb 16, 2021
Exposure apparatus, exposure method, and semiconductor device manufacturing method
TOSHIBA MEMORY CORP1 citations62
US10241397B2Mar 26, 2019
Imprint apparatus and imprint method
TOSHIBA MEMORY CORP1 citations62
US10295409B2May 21, 2019
Substrate measurement system, method of measuring substrate, and computer program product
TOSHIBA MEMORY CORP1 citations60
US10276459B2Apr 30, 2019
Measurement method, measurement program, and measurement system
TOSHIBA MEMORY CORP0 citations51
US9966316B2May 8, 2018
Deposition supporting system, depositing apparatus and manufacturing method of a semiconductor device
TOSHIBA MEMORY CORP0 citations51
US9952505B2Apr 24, 2018
Imprint device and pattern forming method
TOSHIBA MEMORY CORP1 citations51
US10627726B2Apr 21, 2020
Patterning support system, patterning method, and nonvolatile recording medium
TOSHIBA MEMORY CORP0 citations41
US10093044B2Oct 9, 2018
Imprinting apparatus and imprinting method
TOSHIBA MEMORY CORP0 citations40
US9941177B2Apr 10, 2018
Pattern accuracy detecting apparatus and processing system
TOSHIBA MEMORY CORP0 citations37
TOSHIBA KK
8 patentsUS6741327B2May 25, 2004
Method of correcting projection optical system and method of manufacturing semiconductor device
TOSHIBA KK17 citations83
US6842230B2Jan 11, 2005
Exposing method
TOSHIBA KK13 citations82
US8765034B2Jul 1, 2014
Pattern formation method, pattern formation apparatus, and recording medium recorded with alignment program
TOSHIBA KK3 citations62
US9396299B2Jul 19, 2016
Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement program
TOSHIBA KK0 citations51
US9240336B2Jan 19, 2016
Imprint method and imprint apparatus
TOSHIBA KK0 citations51
US9632407B2Apr 25, 2017
Mask processing apparatus and mask processing method
TOSHIBA KK1 citations49
US9087875B2Jul 21, 2015
Pattern formation method for manufacturing semiconductor device using phase-separating self-assembling material
TOSHIBA KK0 citations41
US8953163B2Feb 10, 2015
Exposure apparatus, exposure method, and method of manufacturing semiconductor device
TOSHIBA KK0 citations36
KIOXIA CORP
6 patentsUS11984313B2May 14, 2024
Semiconductor wafer, manufacturing method for semiconductor wafer, and manufacturing method for semiconductor device
KIOXIA CORP0 citations62
US11935775B2Mar 19, 2024
Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
KIOXIA CORP1 citations62
US11267237B2Mar 8, 2022
Substrate bonding apparatus
KIOXIA CORP1 citations54
US11715660B2Aug 1, 2023
Position measuring apparatus and measuring method
KIOXIA CORP0 citations51
US12510830B2Dec 30, 2025
Measuring device and measuring method
KIOXIA CORP0 citations48
US11460765B2Oct 4, 2022
Exposure method, exposure apparatus, and semiconductor device manufacturing method
KIOXIA CORP0 citations44