Inventor
ADAMS TIMOTHY G
US21 patents
⚠️ This page may combine multiple inventors who share the name “ADAMS TIMOTHY G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHIPLEY CO LLC
17 patentsUS5886102AMar 23, 1999
Antireflective coating compositions
SHIPLEY CO LLC238 citations98
US6410209B1Jun 25, 2002
Methods utilizing antireflective coating compositions with exposure under 200 nm
SHIPLEY CO LLC108 citations97
US6316165B1Nov 13, 2001
Planarizing antireflective coating compositions
SHIPLEY CO LLC105 citations97
US7256127B2Aug 14, 2007
Air gap formation
SHIPLEY CO LLC54 citations96
US6653049B2Nov 25, 2003
High conformality antireflective coating compositions
SHIPLEY CO LLC63 citations96
US6190839B1Feb 20, 2001
High conformality antireflective coating compositions
SHIPLEY CO LLC54 citations96
US6033830AMar 7, 2000
Antireflective coating compositions
SHIPLEY CO LLC52 citations96
US6602652B2Aug 5, 2003
Antireflective coating compositions and exposure methods under 200 nm
SHIPLEY CO LLC44 citations95
US5731364AMar 24, 1998
Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
SHIPLEY CO LLC70 citations95
US7018678B2Mar 28, 2006
Electronic device manufacture
SHIPLEY CO LLC43 citations92
US6855466B2Feb 15, 2005
Planarizing antireflective coating compositions
SHIPLEY CO LLC27 citations92
US6989224B2Jan 24, 2006
Polymers with mixed photoacid-labile groups and photoresists comprising same
SHIPLEY CO LLC17 citations83
US5641604AJun 24, 1997
Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers
SHIPLEY CO LLC11 citations73
US7183037B2Feb 27, 2007
Antireflective coatings with increased etch rates
SHIPLEY CO LLC2 citations62
US7147983B1Dec 12, 2006
Dyed photoresists and methods and articles of manufacture comprising same
SHIPLEY CO LLC2 citations61
US6828083B2Dec 7, 2004
Photoresist compositions and use of same
SHIPLEY CO LLC1 citations52
US5719003AFeb 17, 1998
Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers
SHIPLEY CO LLC0 citations52