Inventor

MASUOKA SADAAKI

KR19 patents

⚠️ This page may combine multiple inventors who share the name “MASUOKA SADAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MASUOKA SADAAKI

NEC CORP

Method of fabricating CMOS semiconductor device

Method of manufacturing semiconductor device

Method of manufacturing two-power supply voltage compatible CMOS semiconductor device

Semiconductor device having different sidewall widths and different source/drain depths for NMOS &amp; PMOS structures

Method of fabricating a MOSFET featuring an effective suppression of reverse short-channel effect

MOS field effect transistor with improved pocket regions for suppressing any short channel effects and method for fabricating the same

Method of forming a shared contact in a semiconductor device including MOSFETS

Semiconductor device in which memory cells and peripheral circuits are provided on the same circuit

NEC ELECTRONICS CORP

Semiconductor device including gate insulation films having different thicknesses

Semiconductor device and method of manufacturing the same

Semiconductor device and method for fabricating the same

Semiconductor device

Semiconductor device including gate insulation films having different thicknesses

Semiconductor device

SAMSUNG ELECTRONICS CO LTD

Semiconductor device having a plurality of channel layers and method of manufacturing the same

Semiconductor device having a plurality of channel layers and method of manufacturing the same

Semiconductor device having a plurality of channel layers and method of manufacturing the same

Method of manufacturing semiconductor device having a plurality of channel layers

Method of manufacturing a semiconductor device

Semiconductor device having different sidewall widths and different source/drain depths for NMOS & PMOS structures