Inventor

NIROOMAND ARDAVAN

US46 patents

⚠️ This page may combine multiple inventors who share the name “NIROOMAND ARDAVAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIROOMAND ARDAVAN

MICRON TECHNOLOGY INC

Simplified pitch doubling process flow

Methods of forming multiple lines

Method to clean substrate and improve photoresist profile

Semiconductor processing methods

Method for forming high density patterns

Method of making an antireflective structure

Method of making an antireflective structure

Antireflective structure

Integrated circuit fabrication process to reduce critical dimension loss during etching

Simplified pitch doubling process flow

Methods of forming openings, and methods of forming container capacitors

Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates

Capacitor structures, and DRAM arrays

Methods of forming openings, and methods of forming container capacitors

Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates

Semiconductor processing methods, semiconductor circuitry, and gate stacks

Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride

Reducing resist shrinkage during device fabrication

Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Simplified pitch doubling process flow

Methods of forming patterns utilizing lithography and spacers

Masking techniques and templates for dense semiconductor fabrication

Methods of forming semiconductor constructions

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Simplified pitch doubling process flow

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Semiconductor processing methods of forming photoresist over silicon nitride materials

Method for forming high density patterns

Semiconductor wafer assemblies comprising photoresist over silicon nitride materials

Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Circuitry and gate stacks

Intermediate semiconductor device structures

ALAPATI RAMAKANTH

Methods of forming semiconductor constructions

Methods of forming high density structures and low density structures with a single photomask

Semiconductor constructions

ZHOU BAOSUO

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Method for forming high density patterns

LODESTAR LICENSING GROUP LLC

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

NIROOMAND ARDAVAN

Simplified pitch doubling process flow

INTEL CORP

Gate structures for flash memory and methods of making same