Inventor
GOTTSCHO RICHARD A
US30 patents
⚠️ This page may combine multiple inventors who share the name “GOTTSCHO RICHARD A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
21 patentsUS9778561B2Oct 3, 2017
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP380 citations99
US10831096B2Nov 10, 2020
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP34 citations98
US6632322B1Oct 14, 2003
Switched uniformity control
LAM RES CORP46 citations96
US12105422B2Oct 1, 2024
Photoresist development with halide chemistries
LAM RES CORP13 citations94
US11209729B2Dec 28, 2021
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP21 citations94
US10514598B2Dec 24, 2019
Vacuum-integrated hardmask processes and apparatus
LAM RES CORP33 citations94
US10197908B2Feb 5, 2019
Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework
LAM RES CORP27 citations94
US6151532ANov 21, 2000
Method and apparatus for predicting plasma-process surface profiles
LAM RES CORP70 citations93
US9792393B2Oct 17, 2017
Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization
LAM RES CORP19 citations92
US10585347B2Mar 10, 2020
Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework
LAM RES CORP9 citations84
US10386828B2Aug 20, 2019
Methods and apparatuses for etch profile matching by surface kinetic model optimization
LAM RES CORP8 citations84
US10303830B2May 28, 2019
Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization
LAM RES CORP9 citations84
US9996647B2Jun 12, 2018
Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization
LAM RES CORP12 citations84
US11263737B2Mar 1, 2022
Defect classification and source analysis for semiconductor equipment
LAM RES CORP10 citations83
US6301510B1Oct 9, 2001
Method and apparatus to calibrate a semi-empirical process simulator
LAM RES CORP10 citations82
US12510825B2Dec 30, 2025
Photoresist development with halide chemistries
LAM RES CORP2 citations74
US12510826B2Dec 30, 2025
Photoresist development with halide chemistries
LAM RES CORP2 citations74
USRE39534EMar 27, 2007
Method and apparatus to calibrate a semi-empirical process simulator
LAM RES CORP6 citations73
US11520953B2Dec 6, 2022
Predicting etch characteristics in thermal etching and atomic layer etching
LAM RES CORP3 citations72
US7282454B2Oct 16, 2007
Switched uniformity control
LAM RES CORP3 citations63
US12217945B2Feb 4, 2025
Sorption chamber walls for semiconductor equipment
LAM RES CORP0 citations49
AT & T BELL LAB
7 patentsUS5002631AMar 26, 1991
Plasma etching apparatus and method
AT & T BELL LAB80 citations94
US5124216AJun 23, 1992
Method for monitoring photoresist latent images
AT & T BELL LAB74 citations93
US4902631AFeb 20, 1990
Monitoring the fabrication of semiconductor devices by photon induced electron emission
AT & T BELL LAB26 citations91
US5413954AMay 9, 1995
Method of making a silicon-based device comprising surface plasma cleaning
AT & T BELL LAB27 citations89
US5114233AMay 19, 1992
Method for inspecting etched workpieces
AT & T BELL LAB35 citations89
US5179029AJan 12, 1993
Hydrogen plasma passivation of GaAs
AT & T BELL LAB14 citations67
US5277752AJan 11, 1994
Method for controlling plasma processes
AT & T BELL LAB12 citations65