Inventor
SEITZ FRIEDRICH
DE21 patents
⚠️ This page may combine multiple inventors who share the name “SEITZ FRIEDRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BASF AG
20 patentsUS5475053ADec 12, 1995
Molding composition having a matt surface
BASF AG64 citations96
US5196480AMar 23, 1993
Thermoplastic molding material based on graft copolymers with bimodal particle size distribution and a two-step graft shell
BASF AG66 citations94
US5399620AMar 21, 1995
Block copolymers of acrylate and methacrylate units
BASF AG53 citations92
US5219907AJun 15, 1993
Flameproofed molding composition
BASF AG36 citations92
US5252666AOct 12, 1993
Particulate graft polymer with improved adhesion between grafting base and graft sheath
BASF AG35 citations91
US4962011AOct 9, 1990
Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon
BASF AG22 citations81
US5176985AJan 5, 1993
Reaction product, preparation thereof and radiation-sensitive material obtained therewith
BASF AG20 citations79
US5342898AAug 30, 1994
Particulate graft polymer, and thermoplastic molding material produced therefrom having improved toughness
BASF AG11 citations74
US5336718AAug 9, 1994
Impact modifier and molding material containing it
BASF AG12 citations74
US5266638ANov 30, 1993
Toughened thermoplastic molding material
BASF AG15 citations74
US5817266AOct 6, 1998
Dewatering of water-moist graft rubber
BASF AG11 citations73
US5276256AJan 4, 1994
Flameproofed chlorine-and bromine-free molding composition
BASF AG14 citations73
US5120788AJun 9, 1992
Hermoplastic molding material of improved toughness
BASF AG19 citations73
US5444123AAug 22, 1995
Halogen-free flameproofed thermoplastic molding materials based on polyphenylene ethers and polystyrene
BASF AG19 citations70
US5344877ASep 6, 1994
Molding material from a particulate graft polymer
BASF AG3 citations63
US5114831AMay 19, 1992
Photopolymerizable laminating material
BASF AG5 citations63
US5446094AAug 29, 1995
Thermoplastic coupling agent mixture
BASF AG5 citations62
US4940649AJul 10, 1990
Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
BASF AG6 citations62
US4908448AMar 13, 1990
4-Quinazolone compounds
BASF AG3 citations62
US4891301AJan 2, 1990
Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds
BASF AG5 citations62