Inventor
GEE PAUL
US5 patents
Patents
5 patentsUS7825038B2Nov 2, 2010
Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
APPLIED MATERIALS INC249 citations98
US5994209ANov 30, 1999
Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films
APPLIED MATERIALS INC161 citations98
US6099647AAug 8, 2000
Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films
APPLIED MATERIALS INC53 citations95
US6599574B1Jul 29, 2003
Method and apparatus for forming a dielectric film using helium as a carrier gas
APPLIED MATERIALS INC25 citations91
US6153540ANov 28, 2000
Method of forming phosphosilicate glass having a high wet-etch rate
APPLIED MATERIALS INC3 citations60