Inventor
ROBERSON JR GLENN A
US20 patents
⚠️ This page may combine multiple inventors who share the name “ROBERSON JR GLENN A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMIFAB INC
9 patentsUS6368411B2Apr 9, 2002
Molecular contamination control system
SEMIFAB INC104 citations98
US5879458AMar 9, 1999
Molecular contamination control system
SEMIFAB INC168 citations98
US5315766AMay 31, 1994
Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol
SEMIFAB INC55 citations96
US5115576AMay 26, 1992
Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol
SEMIFAB INC81 citations96
US4977688ADec 18, 1990
Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol
SEMIFAB INC62 citations96
US6221163B1Apr 24, 2001
Molecular contamination control system
SEMIFAB INC70 citations95
US6042651AMar 28, 2000
Molecular contamination control system
SEMIFAB INC82 citations95
US5848933ADec 15, 1998
Docking and environmental purging system for integrated circuit wafer transport assemblies
SEMIFAB INC24 citations91
US6120371ASep 19, 2000
Docking and environmental purging system for integrated circuit wafer transport assemblies
SEMIFAB INC14 citations80
LUCID TREATMENT SYSTEMS INC
4 patentsUS6096185AAug 1, 2000
Method and apparatus for recovery of water and slurry abrasives used for chemical and mechanical planarization
LUCID TREATMENT SYSTEMS INC36 citations91
US5928492AJul 27, 1999
Method and apparatus for recovery of water and slurry abrasives used for chemical and mechanical planarization
LUCID TREATMENT SYSTEMS INC39 citations91
US6059712AMay 9, 2000
Apparatus for continuous separation of fine solid particles from a liquid by centrifugal force
LUCID TREATMENT SYSTEMS INC13 citations72
US5919124AJul 6, 1999
Apparatus for continuous separation of fine solid particles from a liquid by centrifugal force
LUCID TREATMENT SYSTEMS INC6 citations72
TOKYO ELECTRON LTD
2 patentsUS6537916B2Mar 25, 2003
Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process
TOKYO ELECTRON LTD63 citations95
US7064070B2Jun 20, 2006
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
TOKYO ELECTRON LTD17 citations83