Inventor
HSU PING
TW34 patents
⚠️ This page may combine multiple inventors who share the name “HSU PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NANYA TECHNOLOGY CORP
32 patentsUS7019350B2Mar 28, 2006
Trench device structure with single-side buried strap and method for fabricating the same
NANYA TECHNOLOGY CORP15 citations84
US6905897B1Jun 14, 2005
Wafer acceptance testing method and structure of a test key used in the method
NANYA TECHNOLOGY CORP13 citations84
US6815307B1Nov 9, 2004
Method for fabricating a deep trench capacitor
NANYA TECHNOLOGY CORP17 citations84
US6979613B1Dec 27, 2005
Method for fabricating a trench capacitor of DRAM
NANYA TECHNOLOGY CORP12 citations83
US6960503B2Nov 1, 2005
Method for fabricating a trench capacitor
NANYA TECHNOLOGY CORP14 citations83
US11917813B2Feb 27, 2024
Memory array with contact enhancement cap and method for preparing the memory array
NANYA TECHNOLOGY CORP2 citations73
US11792972B2Oct 17, 2023
Method for preparing memory array with contact enhancement cap
NANYA TECHNOLOGY CORP2 citations73
US11063049B2Jul 13, 2021
Semiconductor device with self-aligning landing pad and method of manufacturing the same
NANYA TECHNOLOGY CORP4 citations73
US7081382B2Jul 25, 2006
Trench device structure with single-side buried strap and method for fabricating the same
NANYA TECHNOLOGY CORP6 citations73
US7078291B2Jul 18, 2006
Method for fabricating a deep trench capacitor
NANYA TECHNOLOGY CORP10 citations73
US6821844B2Nov 23, 2004
Collar dielectric process for reducing a top width of a deep trench
NANYA TECHNOLOGY CORP7 citations73
US7098049B2Aug 29, 2006
Shallow trench isolation void detecting method and structure for the same
NANYA TECHNOLOGY CORP3 citations63
US12363881B2Jul 15, 2025
Method for preparing memory array with contact enhancement cap
NANYA TECHNOLOGY CORP0 citations62
US11908693B2Feb 20, 2024
Method for preparing semiconductor device structure with lining layer
NANYA TECHNOLOGY CORP1 citations62
US11894268B2Feb 6, 2024
Method for fabricating semiconductor device with intervening layer
NANYA TECHNOLOGY CORP0 citations62
US11610895B2Mar 21, 2023
Method of manufacturing a semiconductor device with self-aligning landing pad
NANYA TECHNOLOGY CORP0 citations62
US11574841B2Feb 7, 2023
Semiconductor device with intervening layer and method for fabricating the same
NANYA TECHNOLOGY CORP0 citations62
US11557576B2Jan 17, 2023
Method for fabricating semiconductor device with active interposer
NANYA TECHNOLOGY CORP0 citations62
US11521892B2Dec 6, 2022
Method for fabricating a semiconductor device
NANYA TECHNOLOGY CORP0 citations62
US11462519B2Oct 4, 2022
Semiconductor device with active interposer and method for fabricating the same
NANYA TECHNOLOGY CORP0 citations62
US11107785B2Aug 31, 2021
Semiconductor device with a plurality of landing pads and method for fabricating the same
NANYA TECHNOLOGY CORP0 citations62
US11101229B2Aug 24, 2021
Semiconductor device and method for fabricating the same
NANYA TECHNOLOGY CORP0 citations62
US7078289B2Jul 18, 2006
Method for fabricating a deep trench capacitor of DRAM device
NANYA TECHNOLOGY CORP6 citations62
US6953725B2Oct 11, 2005
Method for fabricating memory device having a deep trench capacitor
NANYA TECHNOLOGY CORP4 citations62
US7041567B2May 9, 2006
Isolation structure for trench capacitors and fabrication method thereof
NANYA TECHNOLOGY CORP4 citations61
US6875669B2Apr 5, 2005
Method of controlling the top width of a deep trench
NANYA TECHNOLOGY CORP2 citations61
US10491220B1Nov 26, 2019
Voltage circuit and method of operating the same
NANYA TECHNOLOGY CORP0 citations52
US10483201B1Nov 19, 2019
Semiconductor structure and method for manufacturing the same
NANYA TECHNOLOGY CORP0 citations52
US6831016B2Dec 14, 2004
Method to prevent electrical shorts between adjacent metal lines
NANYA TECHNOLOGY CORP1 citations52
US7105416B2Sep 12, 2006
Method for controlling the top width of a trench
NANYA TECHNOLOGY CORP0 citations51
US7030011B2Apr 18, 2006
Method for avoiding short-circuit of conductive wires
NANYA TECHNOLOGY CORP0 citations51
US7033885B2Apr 25, 2006
Deep trench structure manufacturing process
NANYA TECHNOLOGY CORP0 citations41