Inventor

HINEMAN MAX F

US35 patents

⚠️ This page may combine multiple inventors who share the name “HINEMAN MAX F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HINEMAN MAX F

MICRON TECHNOLOGY INC

Method for selective etching of oxides

Self-aligned, magnetoresistive random-access memory (MRAM) structure utilizing a spacer containment scheme

Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry

Self-aligned, magnetoresitive random-access memory (MRAM) structure utilizing a spacer containment scheme

Cleaning composition useful in semiconductor integrated circuit fabrication

Method of removing etch residues

Cleaning composition useful in semiconductor integrated circuit fabrication

Methods of forming integrated circuitry, semiconductor processing methods, and processing method of forming MRAM circuitry

Method for forming a silicide gate stack for use in a self-aligned contact etch

Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers

Methods of providing an interlevel dielectric layer intermediate different elevation conductive metal layers in the fabrication of integrated circuitry

Method to reduce charge buildup during high aspect ratio contact etch

Methods for forming a metallic damascene structure

Plasma reaction chamber liner comprising ruthenium

Cleaning composition useful in semiconductor integrated circuit fabrication

Cleaning composition useful in semiconductor integrated circuit fabrication

Method to reduce charge buildup during high aspect ratio contact etch

Method of removing etch residues

Plasma etching methods and contact opening forming methods

Plasma reaction chamber liner consisting essentially of osmium

Method of forming contact openings

Methods of etching silicon-oxide-containing compositions

Cleaning composition useful in semiconductor integrated circuit fabricating

Processing method of forming MRAM circuitry

Methods of etching silicon-oxide-containing materials

Cleaning composition useful in semiconductor integrated circuit fabrication

INTEL CORP

Electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques

Electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques

Phase-change memory cell implant for dummy array leakage reduction

Thermal-disturb mitigation in dual-deck cross-point memories

Phase-change memory cell implant for dummy array leakage reduction

Memory array with shorting structure on a dummy array thereof, and method of providing same

INNOVATIVE LASERS CORP

Intracavity laser spectroscope for high sensitivity detection of contaminants

SANDHU GURTEJ S

Method to reduce charge buildup during high aspect ratio contact etch

KOVAL RANDY J

Use of etch process post wordline definition to improve data retention in a flash memory device