Inventor
YAMAWAKU JUN
JP48 patents
⚠️ This page may combine multiple inventors who share the name “YAMAWAKU JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS9941097B2Apr 10, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD110 citations99
US11315765B2Apr 26, 2022
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD8 citations86
US10325758B2Jun 18, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD13 citations84
US9997332B2Jun 12, 2018
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD11 citations84
US9111747B2Aug 18, 2015
Film deposition apparatus, substrate processing apparatus and film deposition method
TOKYO ELECTRON LTD15 citations84
US10804076B2Oct 13, 2020
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD3 citations73
US10777392B2Sep 15, 2020
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations73
US9583312B2Feb 28, 2017
Film formation device, substrate processing device, and film formation method
TOKYO ELECTRON LTD5 citations73
US12537170B2Jan 27, 2026
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations63
US11935727B2Mar 19, 2024
Substrate processing method
TOKYO ELECTRON LTD0 citations63
US9899191B2Feb 20, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations63
US9502215B2Nov 22, 2016
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations63
US9028139B2May 12, 2015
Method of measuring temperature of component in processing chamber of substrate processing apparatus
TOKYO ELECTRON LTD3 citations63
US8052376B2Nov 8, 2011
Turbo-molecular pump, substrate processing apparatus, and method for suppressing attachment of depositions to turbo-molecular pump
TOKYO ELECTRON LTD2 citations63
US12482635B2Nov 25, 2025
Plasma processing device, and plasma processing method
TOKYO ELECTRON LTD0 citations62
US12020900B2Jun 25, 2024
Plasma processing device, and plasma processing method
TOKYO ELECTRON LTD0 citations62
US10937631B2Mar 2, 2021
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD1 citations62
US11578407B2Feb 14, 2023
Film-forming apparatus and film-forming method
TOKYO ELECTRON LTD0 citations52
US11443920B2Sep 13, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US10283328B2May 7, 2019
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations52
US8858753B2Oct 14, 2014
Focus ring heating method, plasma etching apparatus, and plasma etching method
TOKYO ELECTRON LTD1 citations52
US8034720B2Oct 11, 2011
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US10115614B2Oct 30, 2018
Transfer chamber and method for preventing adhesion of particle
TOKYO ELECTRON LTD1 citations50
US10211031B2Feb 19, 2019
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations42
YAMAWAKU JUN
14 patentsUS9349618B2May 24, 2016
Substrate processing apparatus
YAMAWAKU JUN10 citations84
US8257498B2Sep 4, 2012
Substrate transfer module and substrate processing system
YAMAWAKU JUN12 citations84
US9385015B2Jul 5, 2016
Transfer chamber and method for preventing adhesion of particle
YAMAWAKU JUN6 citations82
US9236226B2Jan 12, 2016
Plasma processing apparatus
YAMAWAKU JUN3 citations72
US8824875B2Sep 2, 2014
Method for heating part in processing chamber of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus
YAMAWAKU JUN3 citations62
US8398745B2Mar 19, 2013
Substrate processing apparatus and exhaust method therefor
YAMAWAKU JUN4 citations60
US8845853B2Sep 30, 2014
Substrate processing apparatus and substrate processing method
YAMAWAKU JUN1 citations52
US8777483B2Jul 15, 2014
Temperature measuring apparatus and temperature measuring method
YAMAWAKU JUN0 citations52
US8523428B2Sep 3, 2013
Component in processing chamber of substrate processing apparatus and method of measuring temperature of the component
YAMAWAKU JUN1 citations52
US8409328B2Apr 2, 2013
Substrate transfer device and substrate transfer method
YAMAWAKU JUN1 citations50
US8516715B2Aug 27, 2013
Evacuation method and storage medium
YAMAWAKU JUN0 citations47
US9019505B2Apr 28, 2015
Temperature control system including sub-chiller
YAMAWAKU JUN0 citations42
US8964350B2Feb 24, 2015
Substrate removing method and storage medium
YAMAWAKU JUN0 citations42
US8593780B2Nov 26, 2013
Substrate removing method and storage medium
YAMAWAKU JUN0 citations42
YAMAZAWA YOHEI
4 patentsUS9313872B2Apr 12, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI52 citations98
US9253867B2Feb 2, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI11 citations84
US8741097B2Jun 3, 2014
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI7 citations84
US8608903B2Dec 17, 2013
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI9 citations84