Inventor

NEUMAYER DEBORAH A

US50 patents

⚠️ This page may combine multiple inventors who share the name “NEUMAYER DEBORAH A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NEUMAYER DEBORAH A

IBM

Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality

Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures

Tuneable ferroelectric decoupling capacitor

SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same

Tuneable ferroelectric decoupling capacitor

SiCOH film preparation using precursors with built-in porogen functionality

SiCOH dielectric material with improved toughness and improved Si-C bonding

Materials containing voids with void size controlled on the nanometer scale

SiCOH film preparation using precursors with built-in porogen functionality

Low degradation MRAM encapsulation process using silicon-rich silicon nitride film

Method of manufacturing high dielectric constant material

Disposable laser/flash anneal absorber for embedded neuromorphic memory device fabrication

Selective and conformal passivation layer for 3D high-mobility channel devices

Shallow trench isolation for semiconductor devices

Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning

Selective dopant junction for a group III-V semiconductor device

Selective dopant junction for a group III-V semiconductor device

Delivery systems for gases for gases via the sublimation of solid precursors

Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication

Enhanced adhesive materials and processes for 3D applications

Interconnect structure including airgaps and substractively etched metal lines

Low temperature spacer for advanced semiconductor devices

On-chip biosensors with nanometer scale glass-like carbon electrodes and improved adhesive coupling

On-chip biosensors with nanometer scale glass-like carbon electrodes and improved adhesive coupling

Low temperature encapsulation for magnetic tunnel junction

Boron rich nitride cap for total ionizing dose mitigation in SOI devices

Boron rich nitride cap for total ionizing dose mitigation in SOI devices

Laser doping of crystalline semiconductors using a dopant-containing amorphous silicon stack for dopant source and passivation

Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures

High dielectric constant materials

Low temperature lift-off patterning for glassy carbon films

Magnetic tunnel junction encapsulation using hydrogenated amorphous semiconductor material

Low temperature spacer for advanced semiconductor devices

LIN QINGHUANG

Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication

Patternable low-K dielectric interconnect structure with a graded cap layer and method of fabrication

Patternable dielectric film structure with improved lithography and method of fabricating same

Patternable dielectric film structure with improved lithography and method of fabricating same

BONILLA GRISELDA

Graphene cap for copper interconnect structures

Method of forming a graphene cap for copper interconnect structures

GATES STEPHEN M

Materials containing voids with void size controlled on the nanometer scale

Materials containing voids with void size controlled on the nanometer scale

COTTE JOHN M

Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell

Method to evaluate effectiveness of substrate cleanness and quantity of pin holes in an antireflective coating of a solar cell

SAMSUNG ELECTRONICS CO LTD

Method of forming a graphene cap for copper interconnect structures

EDELSTEIN DANIEL C

Method of fabricating a SiCOH dielectric material with improved toughness and improved Si-C bonding

ASSEFA SOLOMON

Deposition of germanium film

AVOURIS PHAEDON

Nitride gate dielectric for graphene MOSFET

DIMITRAKOPOULOS CHRISTOS D

Bilayer gate dielectric with low equivalent oxide thickness for graphene devices

NGUYEN SON VAN

Ultra low κ plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality

GLOBALFOUNDRIES INC

Laser doping of crystalline semiconductors using a dopant-containing amorphous silicon stack for dopant source and passivation