Inventor
YUBE KUNIO
JP7 patents
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MITSUBISHI GAS CHEMICAL CO
5 patentsUS9466508B2Oct 11, 2016
Liquid composition used in etching multilayer film containing copper and molybdenum, manufacturing method of substrate using said liquid composition, and substrate manufactured by said manufacturing method
MITSUBISHI GAS CHEMICAL CO0 citations49
US9365934B2Jun 14, 2016
Liquid composition used in etching copper- and titanium-containing multilayer film, etching method in which said composition is used, method for manufacturing multilayer-film wiring, and substrate
MITSUBISHI GAS CHEMICAL CO0 citations47
US9217106B2Dec 22, 2015
Etchant and etching process for oxides containing at least indium and gallium
MITSUBISHI GAS CHEMICAL CO1 citations45
US10023797B2Jul 17, 2018
Liquid composition for etching oxides comprising indium, zinc, tin, and oxygen and etching method
MITSUBISHI GAS CHEMICAL CO1 citations42
US9824899B2Nov 21, 2017
Etching liquid for oxide containing zinc and tin, and etching method
MITSUBISHI GAS CHEMICAL CO0 citations42