Inventor

OKOROANYANWU UZODINMA

US36 patents

⚠️ This page may combine multiple inventors who share the name “OKOROANYANWU UZODINMA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OKOROANYANWU UZODINMA

ADVANCED MICRO DEVICES INC

Selective photoresist hardening to facilitate lateral trimming

Polymer memory device formed in via opening

Method(s) facilitating formation of memory cell(s) and patterned conductive

Planar polymer memory device

Self assembly of conducting polymer for formation of polymer memory cell

Process for reducing the critical dimensions of integrated circuit device features

Process for forming sub-lithographic photoresist features by modification of the photoresist surface

Process for preventing deformation of patterned photoresist features

Interconnect structure with silicon containing alicyclic polymers and low-k dielectric materials and method of making same with single and dual damascene techniques

Interconnect structure with low k dielectric materials and method of making the same with single and dual damascene techniques

Stacked organic memory devices and methods of operating and fabricating

Stacked organic memory devices and methods of operating and fabricating

Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices

Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits

Two mask photoresist exposure pattern for dense and isolated regions

Stacked organic memory devices and methods of operating and fabricating

Process for improving the etch stability of ultra-thin photoresist

SEM inspection and analysis of patterned photoresist features

Materials and methods for sublithographic patterning of gate structures in integrated circuit devices

Self-aligned pattern formation using wavelenghts

Two mask photoresist exposure pattern for dense and isolated regions

CuS formation by anodic sulfide passivation of copper surface

Process for reducing critical dimensions of contact holes, vias, and trench structures in integrated circuits

Dielectric pattern formation for organic electronic devices

Fluorine-passivated reticles for use in lithography and methods for fabricating the same

SPANSION LLC

Stacked organic memory devices and methods of operating and fabricating

Semiconductor device built on plastic substrate

Processing a copolymer to form a polymer memory cell

GLOBALFOUNDRIES INC

EUV pellicle and method for fabricating semiconductor dies using same

Mask structures and methods of manufacturing

OKOROANYANWU UZODINMA

Method for forming a high resolution resist pattern on a semiconductor wafer

Method for producing a high resolution resist pattern on a semiconductor wafer

UNIV TEXAS

Photoresist compositions comprising norbornene derivative polymers with acid labile groups

LAFONTAINE BRUNO M

Optical polarizer with nanotube array

WALLOW THOMAS

Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis

LEVINSON HARRY J

Fluorine-passivated reticles for use in lithography and methods for fabricating the same