Inventor
GLODDE MARTIN
US33 patents
⚠️ This page may combine multiple inventors who share the name “GLODDE MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
17 patentsUS10096477B2Oct 9, 2018
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
IBM7 citations84
US9671694B1Jun 6, 2017
Wet strippable gap fill materials
IBM12 citations84
US9337033B1May 10, 2016
Dielectric tone inversion materials
IBM9 citations84
US9281212B1Mar 8, 2016
Dielectric tone inversion materials
IBM6 citations84
US8999625B2Apr 7, 2015
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
IBM8 citations84
US8039194B2Oct 18, 2011
Photoacid generators for extreme ultraviolet lithography
IBM9 citations84
US7655379B2Feb 2, 2010
Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions
IBM9 citations81
US10553432B2Feb 4, 2020
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
IBM2 citations73
US10345702B2Jul 9, 2019
Polymer brushes for extreme ultraviolet photolithography
IBM4 citations73
US10312087B2Jun 4, 2019
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
IBM2 citations73
US9425053B2Aug 23, 2016
Block mask litho on high aspect ratio topography with minimal semiconductor material damage
IBM4 citations71
US10964541B2Mar 30, 2021
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
IBM0 citations62
US10727055B2Jul 28, 2020
Method to increase the lithographic process window of extreme ultra violet negative tone development resists
IBM0 citations52
US10656523B2May 19, 2020
Polymer brushes for extreme ultraviolet photolithography
IBM0 citations52
US10388521B2Aug 20, 2019
Method to increase the lithographic process window of extreme ultra violet negative tone development resists
IBM0 citations52
US10170301B2Jan 1, 2019
Adhesion of polymers on silicon substrates
IBM0 citations52
US9431250B2Aug 30, 2016
Deep well implant using blocking mask
IBM0 citations39
GLOBALFOUNDRIES INC
4 patentsUS9465290B2Oct 11, 2016
Near-infrared absorbing film compositions
GLOBALFOUNDRIES INC2 citations63
US9348228B2May 24, 2016
Acid-strippable silicon-containing antireflective coating
GLOBALFOUNDRIES INC1 citations52
US9460934B2Oct 4, 2016
Wet strip process for an antireflective coating layer
GLOBALFOUNDRIES INC0 citations50
US9551696B2Jan 24, 2017
Cleanability assessment of sublimate from lithography materials
GLOBALFOUNDRIES INC0 citations48