P

Inventor

FREEMAN GREGORY G

US47 patents
⚠️ This page may combine multiple inventors who share the name “FREEMAN GREGORY G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

38 patents
US6492238B1Dec 10, 2002

Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit

IBM45 citations95
US7144787B2Dec 5, 2006

Methods to improve the SiGe heterojunction bipolar device performance

IBM16 citations93
US7102205B2Sep 5, 2006

Bipolar transistor with extrinsic stress layer

IBM32 citations93
US6414371B1Jul 2, 2002

Process and structure for 50+ gigahertz transistor

IBM38 citations93
US6979884B2Dec 27, 2005

Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border

IBM27 citations92
US6780695B1Aug 24, 2004

BiCMOS integration scheme with raised extrinsic base

IBM24 citations92
US6472288B2Oct 29, 2002

Method of fabricating bipolar transistors with independent impurity profile on the same chip

IBM21 citations89
US8940595B2Jan 27, 2015

Faceted intrinsic epitaxial buffer layer for reducing short channel effects while maximizing channel stress levels

IBM8 citations84
US7749822B2Jul 6, 2010

Method of forming a resistor and an FET from the metal portion of a MOSFET metal gate stack

IBM17 citations84
US7615457B2Nov 10, 2009

Method of fabricating self-aligned bipolar transistor having tapered collector

IBM9 citations84
US7476914B2Jan 13, 2009

Methods to improve the SiGe heterojunction bipolar device performance

IBM8 citations84
US7425754B2Sep 16, 2008

Structure and method of self-aligned bipolar transistor having tapered collector

IBM13 citations84
US7217988B2May 15, 2007

Bipolar transistor with isolation and direct contacts

IBM10 citations84
US7180157B2Feb 20, 2007

Bipolar transistor with a very narrow emitter feature

IBM12 citations84
US6960820B2Nov 1, 2005

Bipolar transistor self-alignment with raised extrinsic base extension and methods of forming same

IBM14 citations84
US6927476B2Aug 9, 2005

Bipolar device having shallow junction raised extrinsic base and method for making the same

IBM16 citations84
US6506656B2Jan 14, 2003

Stepped collector implant and method for fabrication

IBM18 citations84
US6667521B2Dec 23, 2003

Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit

IBM15 citations83
US7329941B2Feb 12, 2008

Creating increased mobility in a bipolar device

IBM6 citations74
US7170083B2Jan 30, 2007

Bipolar transistor with collector having an epitaxial Si:C region

IBM9 citations74
US6864517B2Mar 8, 2005

Bipolar structure with two base-emitter junctions in the same circuit

IBM7 citations74
US6858485B2Feb 22, 2005

Method for creation of a very narrow emitter feature

IBM8 citations74
US6844225B2Jan 18, 2005

Self-aligned mask formed utilizing differential oxidation rates of materials

IBM5 citations74
US6803642B2Oct 12, 2004

Bipolar device having non-uniform depth base-emitter junction

IBM7 citations73
US6531720B2Mar 11, 2003

Dual sidewall spacer for a self-aligned extrinsic base in SiGe heterojunction bipolar transistors

IBM9 citations73
US9287399B2Mar 15, 2016

Faceted intrinsic epitaxial buffer layer for reducing short channel effects while maximizing channel stress levels

IBM5 citations72
US7741186B2Jun 22, 2010

Creating increased mobility in a bipolar device

IBM2 citations63
US7611954B2Nov 3, 2009

Bipolar transistor self-alignment with raised extrinsic base extension and methods of forming same

IBM3 citations63
US7466010B2Dec 16, 2008

Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border

IBM4 citations63
US7442595B2Oct 28, 2008

Bipolar transistor with collector having an epitaxial Si:C region

IBM3 citations63
US7288827B2Oct 30, 2007

Self-aligned mask formed utilizing differential oxidation rates of materials

IBM3 citations63
US8017483B2Sep 13, 2011

Method of creating asymmetric field-effect-transistors

IBM5 citations62
US7790553B2Sep 7, 2010

Methods for forming high performance gates and structures thereof

IBM5 citations62
US7611953B2Nov 3, 2009

Bipolar transistor with isolation and direct contacts

IBM5 citations62
US7355221B2Apr 8, 2008

Field effect transistor having an asymmetrically stressed channel region

IBM3 citations61
US9240354B2Jan 19, 2016

Semiconductor device having diffusion barrier to reduce back channel leakage

IBM0 citations52
US7348250B2Mar 25, 2008

Bipolar structure with two base-emitter junctions in the same circuit

IBM1 citations52
US7863143B2Jan 4, 2011

High performance schottky-barrier-source asymmetric MOSFETs

IBM0 citations42

GLOBALFOUNDRIES INC

6 patents

ZHU HUILONG

2 patents

CHOU ANTHONY I

1 patent