Inventor
FREEMAN GREGORY G
US47 patents
⚠️ This page may combine multiple inventors who share the name “FREEMAN GREGORY G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
38 patentsUS6492238B1Dec 10, 2002
Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit
IBM45 citations95
US7144787B2Dec 5, 2006
Methods to improve the SiGe heterojunction bipolar device performance
IBM16 citations93
US7102205B2Sep 5, 2006
Bipolar transistor with extrinsic stress layer
IBM32 citations93
US6414371B1Jul 2, 2002
Process and structure for 50+ gigahertz transistor
IBM38 citations93
US6979884B2Dec 27, 2005
Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border
IBM27 citations92
US6780695B1Aug 24, 2004
BiCMOS integration scheme with raised extrinsic base
IBM24 citations92
US6472288B2Oct 29, 2002
Method of fabricating bipolar transistors with independent impurity profile on the same chip
IBM21 citations89
US8940595B2Jan 27, 2015
Faceted intrinsic epitaxial buffer layer for reducing short channel effects while maximizing channel stress levels
IBM8 citations84
US7749822B2Jul 6, 2010
Method of forming a resistor and an FET from the metal portion of a MOSFET metal gate stack
IBM17 citations84
US7615457B2Nov 10, 2009
Method of fabricating self-aligned bipolar transistor having tapered collector
IBM9 citations84
US7476914B2Jan 13, 2009
Methods to improve the SiGe heterojunction bipolar device performance
IBM8 citations84
US7425754B2Sep 16, 2008
Structure and method of self-aligned bipolar transistor having tapered collector
IBM13 citations84
US7217988B2May 15, 2007
Bipolar transistor with isolation and direct contacts
IBM10 citations84
US7180157B2Feb 20, 2007
Bipolar transistor with a very narrow emitter feature
IBM12 citations84
US6960820B2Nov 1, 2005
Bipolar transistor self-alignment with raised extrinsic base extension and methods of forming same
IBM14 citations84
US6927476B2Aug 9, 2005
Bipolar device having shallow junction raised extrinsic base and method for making the same
IBM16 citations84
US6506656B2Jan 14, 2003
Stepped collector implant and method for fabrication
IBM18 citations84
US6667521B2Dec 23, 2003
Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit
IBM15 citations83
US7329941B2Feb 12, 2008
Creating increased mobility in a bipolar device
IBM6 citations74
US7170083B2Jan 30, 2007
Bipolar transistor with collector having an epitaxial Si:C region
IBM9 citations74
US6864517B2Mar 8, 2005
Bipolar structure with two base-emitter junctions in the same circuit
IBM7 citations74
US6858485B2Feb 22, 2005
Method for creation of a very narrow emitter feature
IBM8 citations74
US6844225B2Jan 18, 2005
Self-aligned mask formed utilizing differential oxidation rates of materials
IBM5 citations74
US6803642B2Oct 12, 2004
Bipolar device having non-uniform depth base-emitter junction
IBM7 citations73
US6531720B2Mar 11, 2003
Dual sidewall spacer for a self-aligned extrinsic base in SiGe heterojunction bipolar transistors
IBM9 citations73
US9287399B2Mar 15, 2016
Faceted intrinsic epitaxial buffer layer for reducing short channel effects while maximizing channel stress levels
IBM5 citations72
US7741186B2Jun 22, 2010
Creating increased mobility in a bipolar device
IBM2 citations63
US7611954B2Nov 3, 2009
Bipolar transistor self-alignment with raised extrinsic base extension and methods of forming same
IBM3 citations63
US7466010B2Dec 16, 2008
Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border
IBM4 citations63
US7442595B2Oct 28, 2008
Bipolar transistor with collector having an epitaxial Si:C region
IBM3 citations63
US7288827B2Oct 30, 2007
Self-aligned mask formed utilizing differential oxidation rates of materials
IBM3 citations63
US8017483B2Sep 13, 2011
Method of creating asymmetric field-effect-transistors
IBM5 citations62
US7790553B2Sep 7, 2010
Methods for forming high performance gates and structures thereof
IBM5 citations62
US7611953B2Nov 3, 2009
Bipolar transistor with isolation and direct contacts
IBM5 citations62
US7355221B2Apr 8, 2008
Field effect transistor having an asymmetrically stressed channel region
IBM3 citations61
US9240354B2Jan 19, 2016
Semiconductor device having diffusion barrier to reduce back channel leakage
IBM0 citations52
US7348250B2Mar 25, 2008
Bipolar structure with two base-emitter junctions in the same circuit
IBM1 citations52
US7863143B2Jan 4, 2011
High performance schottky-barrier-source asymmetric MOSFETs
IBM0 citations42
GLOBALFOUNDRIES INC
6 patentsUS10191108B2Jan 29, 2019
On-chip sensor for monitoring active circuits on integrated circuit (IC) chips
GLOBALFOUNDRIES INC2 citations70
US9406569B2Aug 2, 2016
Semiconductor device having diffusion barrier to reduce back channel leakage
GLOBALFOUNDRIES INC0 citations52
US9305999B2Apr 5, 2016
Stress-generating structure for semiconductor-on-insulator devices
GLOBALFOUNDRIES INC0 citations52
US9906213B2Feb 27, 2018
Reducing thermal runaway in inverter devices
GLOBALFOUNDRIES INC1 citations51
US9552455B2Jan 24, 2017
Method for an efficient modeling of the impact of device-level self-heating on electromigration limited current specifications
GLOBALFOUNDRIES INC1 citations51
US9953873B2Apr 24, 2018
Methods of modulating the morphology of epitaxial semiconductor material
GLOBALFOUNDRIES INC0 citations42