Inventor

AUSSCHNITT CHRISTOPHER P

US57 patents

⚠️ This page may combine multiple inventors who share the name “AUSSCHNITT CHRISTOPHER P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AUSSCHNITT CHRISTOPHER P

IBM

Optical metrology tool and method of using same

Optical metrology tool and method of using same

Integrated lithographic print and detection model for optical CD

Segmented bar-in-bar target

Process for controlling etching parameters

Enhanced optical detection of minimum features using depolarization

Process for controlling exposure dose or focus parameters using tone reversing pattern

Optically measurable serpentine edge tone reversed targets

Measurement method for linewidth metrology

Method of measuring bias and edge overlay error for sub-0.5 micron ground rules

Edge overlay measurement target for sub-0.5 micron ground rules

Monitoring of minimum features on a substrate

Overlay target and measurement method using reference and sub-grids

Combined segmented and nonsegmented bar-in-bar targets

Focus or exposure dose parameter control system using tone reversing patterns

Method for overlay control system

Multi-layer alignment and overlay target and measurement method

Overlay target and measurement method using reference and sub-grids

Process and apparatus to adjust exposure dose in lithography systems

Micro-surface fabrication process

Etching parameter control system process

Method of improving grating test pattern for lithography monitoring and controlling

Method of patterning process metrology based on the intrinsic focus offset

Single tone process window metrology target and method for lithographic processing

Focus control system

Structure and method for amplifying target overlay errors using the synthesized beat signal between interleaved arrays of differing periodicity

Double-sided wafer exposure method and device

Phase shifted test pattern for monitoring focus and aberrations in optical projection systems

Combined layer-to-layer and within-layer overlay control system

Optical measurement of lithographic power bias of minimum features

Darkfield imaging for enhancing optical detection of edges and minimum features

Electrically testable process window monitor for lithographic processing

Discrete sampling based nonlinear control system

Method to control semiconductor device overlay using post etch image metrology

Multi layer alignment and overlay target and measurement method

Focus blur measurement and control method

Overlay target and measurement method using reference and sub-grids

Method for determining semiconductor overlay on groundrule devices

Methods for normalizing error in photolithographic processes

Multi-layer chip overlay target and measurement

Fabrication of lithographic image fields using a proximity stitch metrology

Container for storing and transporting fragile objects

AUSSCHNITT CHRISTOPHER P

Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control

Multilayer alignment and overlay target and measurement method

Multi layer alignment and overlay target and measurement method

Self-calibrated alignment and overlay target and measurement

PERKIN ELMER CORP

Overlay test wafer

Coating apparatus

SHIPLEY CO

Lithographic process analysis and control system

BELL TELEPHONE LABOR INC

Detection of ground state hydrogen and deuterium