Inventor
TANABE TAKAYOSHI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “TANABE TAKAYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
7 patentsUS6136500AOct 24, 2000
Radiation sensitive resin composition
JSR CORP88 citations98
US6120972ASep 19, 2000
Radiation-sensitive resin composition
JSR CORP23 citations92
US5994022ANov 30, 1999
Radiation sensitive resin composition
JSR CORP46 citations92
US6235446B1May 22, 2001
Radiation sensitive resin composition
JSR CORP27 citations89
US5962180AOct 5, 1999
Radiation sensitive composition
JSR CORP32 citations89
US7173072B2Feb 6, 2007
Radiation-curable resin composition for forming optical part and optical part
JSR CORP15 citations81
US5952150ASep 14, 1999
Radiation sensitive resin composition
JSR CORP16 citations74
SHARP KK
7 patentsUS6066920AMay 23, 2000
Illumination device, method for driving the illumination device and display including the illumination device
SHARP KK155 citations98
US5808708ASep 15, 1998
Lighting apparatus
SHARP KK144 citations95
US7553060B2Jun 30, 2009
Backlight device and liquid crystal display
SHARP KK21 citations92
US6357888B1Mar 19, 2002
Surface illuminant device emitting light in multiple directions in concentrative manner
SHARP KK24 citations91
US7789549B2Sep 7, 2010
Light guide plate, surface light source, and liquid crystal display device
SHARP KK14 citations84
US7802911B2Sep 28, 2010
Backlight device and liquid crystal display
SHARP KK6 citations74
US7876393B2Jan 25, 2011
Surface-area light source and LCD device having light guide plate with a side surface having a staircase shape in which a plurality of light emitting devices are fixed to respective steps thereof
SHARP KK6 citations63
JAPAN SYNTHETIC RUBBER CO LTD
3 patentsUS5731129AMar 24, 1998
Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer
JAPAN SYNTHETIC RUBBER CO LTD25 citations92
US5410005AApr 25, 1995
Reflection preventing film and process for forming resist pattern using the same
JAPAN SYNTHETIC RUBBER CO LTD32 citations92
US5736298AApr 7, 1998
Water developable photosensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD19 citations83